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具有可控畴切换动力学的节能铁电畴壁存储器。

Energy-Efficient Ferroelectric Domain Wall Memory with Controlled Domain Switching Dynamics.

作者信息

Wang Chao, Jiang Jun, Chai Xiaojie, Lian Jianwei, Hu Xiaobing, Jiang An Quan

机构信息

State Key Laboratory of ASIC & System, School of Microelectronics, Fudan University, Shanghai 200433, China.

出版信息

ACS Appl Mater Interfaces. 2020 Oct 7;12(40):44998-45004. doi: 10.1021/acsami.0c13534. Epub 2020 Sep 24.

DOI:10.1021/acsami.0c13534
PMID:32914949
Abstract

High readout domain-wall currents in LiNbO single-crystal nanodevices are attractive because of their application in a ferroelectric domain wall random access memory (DWRAM) to drive a fast memory circuit. However, the wall current at a small read voltage would increase nonlinearly at a much higher write voltage, which could cause high energy consumption. Here, we resolved this problem by controlling the two-step domain forward growth within a ferroelectric mesa-like cell that was formed at the surface of an X-cut LiNbO single crystal. The mesa-like cell contacts two side Pt/Ni electrodes that extend over the cell surface by 90 nm for the generation of an in-plane inhomogeneous electric field. The domain forward growth processes at first in the formation of an inclined charged 180° domain to span the in-plane electrode gap under a write voltage of 5 V in a large readout wall current, and then, the domain expands fully throughout the entire cell in the formation of a neutral 180° wall to reduce the wall current by 10 times at a higher write voltage of 6 V. Meantime, the domain below the mesa-like cell in an opposite orientation is unchanged to serve as the reference. A higher wall current at a lower read voltage and a lower wall current at a higher write voltage can satisfy both requirements of low energy consumption and fast operation speeds for the DWRAM.

摘要

铌酸锂(LiNbO)单晶纳米器件中的高读出畴壁电流因其在铁电畴壁随机存取存储器(DWRAM)中用于驱动快速存储电路的应用而备受关注。然而,在小读出电压下的壁电流在高得多的写入电压下会非线性增加,这可能导致高能耗。在此,我们通过控制在X切铌酸锂单晶表面形成的铁电台面状单元内的两步畴正向生长来解决这个问题。台面状单元与两个侧面的Pt/Ni电极接触,这两个电极在单元表面延伸90 nm,用于产生面内不均匀电场。畴正向生长过程首先是在5 V写入电压下形成倾斜的带电180°畴以跨越面内电极间隙,此时读出壁电流较大,然后,在6 V更高的写入电压下,畴在形成中性180°壁的过程中完全扩展到整个单元,使壁电流降低10倍。同时,台面状单元下方相反取向的畴保持不变以作为参考。较低读出电压下的较高壁电流和较高写入电压下的较低壁电流可以满足DWRAM对低能耗和快速运行速度的要求。

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引用本文的文献

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