Characterization of the error of the speckle-based wavefront metrology device at Shanghai Synchrotron Radiation Facility.

A metrology device based on the near-field speckle technique was developed in the x-ray test beamline at the Shanghai Synchrotron Radiation Facility to meet the at-wavelength detection requirements of ultra-high-precision optical elements. Different sources of error that limit the uncertainty of the instrument were characterized. Two main factors that contribute to the uncertainty of the measurements were investigated: (1) noise errors introduced by the electronics and the errors introduced by the algorithm and (2) stability errors owing to environmental conditions. The results show that the high measurement stability of the device is realized because it is insensitive to the effect of the external environment. The repetition accuracy of the device achieved 9 nrad (rms) when measuring the planar mirror that produces weak phase curvature.