Jiang Hui, Tian Naxi, Liang Dongxu, Du Guohao, Yan Shuai
Shanghai Synchrotron Radiation Facility, Shanghai Advanced Research Institute, Chinese Academy of Sciences, Zhangheng Road 239, Pudong District, Shanghai 201204, People's Republic of China.
Shanghai Institute of Applied Physics, Chinese Academy of Sciences, Jiading District, Shanghai People's Republic of China.
J Synchrotron Radiat. 2019 May 1;26(Pt 3):729-736. doi: 10.1107/S1600577519003047. Epub 2019 Apr 9.
As a strong tool for the study of nanoscience, the synchrotron hard X-ray nanoprobe technique enables researchers to investigate complex samples with many advantages, such as in situ setup, high sensitivity and the integration of various experimental methods. In recent years, an important goal has been to push the focusing spot size to the diffraction limit of ∼10 nm. The multilayer-based Kirkpatrick-Baez (KB) mirror system is one of the most important methods used to achieve this goal. This method was chosen by the nanoprobe beamline of the Phase-II project at the Shanghai Synchrotron Radiation Facility. To overcome the limitations of current polishing technologies, the use of an additional phase compensator was necessary to decrease the wavefront distortions. In this experiment, a prototype phase compensator has been created to show how to obtain precise wavefront compensation. With the use of finite-element analysis and Fizeau interferometer measurements, some important factors such as the piezoresponse, different actuator distributions, stability and hysteresis were investigated. A global optimization method based on the measured piezoresponse has also been developed. This method overcame the limitations of the previous local algorithm related to the adjustment of every single actuator for compact piezoelectric layouts. The mirror figure can approach a target figure after several iterations. The figure difference can be reduced to several nanometres, which is far better than the mirror figure errors. The prototype was also used to successfully compensate for the real wavefront errors from upstream and for its own figure errors, measured using the speckle scanning technique. The residual figure error was reduced to a root-mean-square value of 0.7 nm.
作为纳米科学研究的强大工具,同步辐射硬X射线纳米探针技术使研究人员能够研究复杂样品,具有诸多优势,如原位设置、高灵敏度以及各种实验方法的集成。近年来,一个重要目标是将聚焦光斑尺寸推至约10纳米的衍射极限。基于多层膜的柯克帕特里克 - 贝兹(KB)镜系统是实现这一目标的最重要方法之一。该方法被上海同步辐射装置二期项目的纳米探针光束线所采用。为克服当前抛光技术的局限性,需要使用额外的相位补偿器来减少波前畸变。在本实验中,制作了一个原型相位补偿器以展示如何获得精确的波前补偿。通过使用有限元分析和斐索干涉仪测量,研究了一些重要因素,如压阻响应、不同的致动器分布、稳定性和滞后现象。还开发了一种基于测量压阻响应的全局优化方法。该方法克服了先前局部算法在紧凑压电布局中对每个单个致动器进行调整的局限性。经过几次迭代后,镜面形状可接近目标形状。形状差异可减小到几纳米,远优于镜面形状误差。该原型还成功用于补偿来自上游的实际波前误差及其自身的形状误差,使用散斑扫描技术进行测量。残余形状误差降低到均方根值0.7纳米。