Wang Qian, Song Zhenjun, Tao Junhui, Jin Haiqin, Li Sha, Wang Yuran, Liu Xuejuan, Zhang Lin
School of Physics and Mechanical & Electrical Engineering, Hubei Engineering Technology Research Center of Environmental Purification Materials, Hubei University of Education Wuhan 430000 China
School of Parmaceutical and Materials Engineering, Taizhou University Taizhou 318000 PR China.
RSC Adv. 2023 Jan 19;13(5):2903-2911. doi: 10.1039/d2ra07949f. eCollection 2023 Jan 18.
Designing a specific heterojunction by assembling suitable two-dimensional (2D) semiconductors has shown significant potential in next-generation micro-nano electronic devices. In this paper, we study the structural and electronic properties of graphene-MoS (Gr-MoS) heterostructures with in-plain biaxial strain using density functional theory. It is found that the interaction between graphene and monolayer MoS is characterized by a weak van der Waals interlayer coupling with the stable layer spacing of 3.39 Å and binding energy of 0.35 J m. In the presence of MoS, the linear bands on the Dirac cone of graphene are slightly split. A tiny band gap about 1.2 meV opens in the Gr-MoS heterojunction due to the breaking of sublattice symmetry, and it could be effectively modulated by strain. Furthermore, an n-type Schottky contact is formed at the Gr-MoS interface with a Schottky barrier height of 0.33 eV, which can be effectively modulated by in-plane strain. Especially, an n-type ohmic contact is obtained when 6% tensile strain is imposed. The appearance of the non-zero band gap in graphene has opened up new possibilities for its application and the ohmic contact predicts the Gr-MoS van der Waals heterojunction nanocomposite as a competitive candidate in next-generation optoelectronics and Schottky devices.
通过组装合适的二维(2D)半导体来设计特定的异质结在下一代微纳电子器件中已显示出巨大潜力。在本文中,我们使用密度泛函理论研究了具有面内双轴应变的石墨烯 - 二硫化钼(Gr - MoS)异质结构的结构和电子性质。研究发现,石墨烯与单层二硫化钼之间的相互作用以弱范德华层间耦合为特征,稳定层间距为3.39 Å,结合能为0.35 J/m。在存在二硫化钼的情况下,石墨烯狄拉克锥上的线性能带略有分裂。由于子晶格对称性破缺,Gr - MoS异质结中出现了约1.2 meV的微小带隙,并且可以通过应变有效地调制。此外,在Gr - MoS界面处形成了n型肖特基接触,肖特基势垒高度为0.33 eV,可通过面内应变有效地调制。特别地,当施加6%的拉伸应变时获得了n型欧姆接触。石墨烯中出现的非零带隙为其应用开辟了新的可能性,而欧姆接触预示着Gr - MoS范德华异质结纳米复合材料是下一代光电子学和肖特基器件中有竞争力的候选材料。