Ozdemir Resul, Van Avermaet Hannes, Erdem Onur, Schiettecatte Pieter, Hens Zeger, Aubert Tangi
Physics and Chemistry of Nanostructures, Ghent University, 9000 Gent, Belgium.
ICGM, University of Montpellier, CNRS, ENSCM, 34000 Montpellier, France.
ACS Appl Mater Interfaces. 2023 Feb 9. doi: 10.1021/acsami.2c20982.
For their unique optical properties, quantum dots (QDs) have been extensively used as light emitters in a number of photonic and optoelectronic applications. They even met commercialization success through their implementation in high-end displays with unmatched brightness and color rendering. For such applications, however, QDs must be shielded from oxygen and water vapor, which are known to degrade their optical properties over time. Even with highly qualitative QDs, this can only be achieved through their encapsulation between barrier layers. With the emergence of mini- and microLED for higher contrast and miniaturized displays, new strategies must be found for the concomitant patterning and encapsulation of QDs, with sub-millimeter resolution. To this end, we developed a new approach for the direct patterning of QDs through maskless lithography. By combining QDs in photopolymerizable resins with digital light processing (DLP) projectors, we developed a versatile and massively parallel fabrication process for the additive manufacturing of functional structures that we refer to as QD pockets. These 3D heterostructures are designed to provide isotropic encapsulation of the QDs, and hence prevent edge ingress from the lateral sides of QD films, which remains a shortcoming of the current technologies.
由于其独特的光学性质,量子点(QDs)已在许多光子和光电子应用中被广泛用作发光体。它们甚至通过在具有无与伦比的亮度和色彩渲染的高端显示器中的应用取得了商业化成功。然而,对于此类应用,量子点必须与氧气和水蒸气隔绝,因为众所周知,随着时间的推移,氧气和水蒸气会降低其光学性质。即使是高质量的量子点,也只能通过将它们封装在阻挡层之间来实现这一点。随着用于更高对比度和小型化显示器的微型和微型发光二极管的出现,必须找到新的策略来实现量子点的同时图案化和封装,分辨率要达到亚毫米级。为此,我们开发了一种通过无掩模光刻直接对量子点进行图案化的新方法。通过将可光聚合树脂中的量子点与数字光处理(DLP)投影仪相结合,我们开发了一种通用且大规模并行的制造工艺,用于增材制造我们称为量子点口袋的功能结构。这些三维异质结构旨在为量子点提供各向同性封装,从而防止从量子点薄膜侧面进入边缘,而这仍然是当前技术的一个缺点。