Antolini Francesco
Fusion and Technologies for Nuclear Safety and Security Department, Physical Technology for Safety and Health Division, ENEA C.R. Frascati, Via E. Fermi 45, 00044 Frascati, Italy.
Nanomaterials (Basel). 2023 Jul 5;13(13):2008. doi: 10.3390/nano13132008.
Patterning, stability, and dispersion of the semiconductor quantum dots (scQDs) are three issues strictly interconnected for successful device manufacturing. Recently, several authors adopted direct optical patterning (DOP) as a step forward in photolithography to position the scQDs in a selected area. However, the chemistry behind the stability, dispersion, and patterning has to be carefully integrated to obtain a functional commercial device. This review describes different chemical strategies suitable to stabilize the scQDs both at a single level and as an ensemble. Special attention is paid to those strategies compatible with direct optical patterning (DOP). With the same purpose, the scQDs' dispersion in a matrix was described in terms of the scQD surface ligands' interactions with the matrix itself. The chemical processes behind the DOP are illustrated and discussed for five different approaches, all together considering stability, dispersion, and the patterning itself of the scQDs.
半导体量子点(scQDs)的图案化、稳定性和分散性是成功制造器件时紧密相关的三个问题。最近,几位作者采用直接光学图案化(DOP)作为光刻技术的一项进展,将scQDs定位在选定区域。然而,稳定性、分散性和图案化背后的化学原理必须仔细整合,才能获得功能性商业器件。本综述描述了适用于在单个层面和整体层面稳定scQDs的不同化学策略。特别关注那些与直接光学图案化(DOP)兼容的策略。出于同样的目的,根据scQD表面配体与基质本身的相互作用,描述了scQDs在基质中的分散情况。针对五种不同方法阐述并讨论了DOP背后的化学过程,同时考虑了scQDs的稳定性、分散性和图案化本身。