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通过卷对卷凹版印刷工艺对全印刷碳纳米管薄膜晶体管阵列进行快速均匀性分析。

Rapid Uniformity Analysis of Fully Printed SWCNT-Based Thin Film Transistor Arrays via Roll-to-Roll Gravure Process.

作者信息

Choi Yunhyok, Jung Younsu, Song Reem, Park Jinhwa, Parajuli Sajjan, Shrestha Sagar, Cho Gyoujin, Kim Byung-Sung

机构信息

Department of Semiconductor Systems Engineering, College of Information and Communication Engineering, Sungkyunkwan University, Suwon-si 16419, Republic of Korea.

Department of Biophysics, Institute of Quantum Biophysics, Research Engineering Center for R2R-Printed Flexible Computer, Sungkyunkwan University, Suwon-si 16419, Republic of Korea.

出版信息

Nanomaterials (Basel). 2023 Feb 1;13(3):590. doi: 10.3390/nano13030590.

Abstract

The roll-to-roll (R2R) gravure process has the potential for manufacturing single-wall carbon nanotubes (SWCNT)-based thin film transistor (TFT) arrays on a flexible plastic substrate. A significant hurdle toward the commercialization of the R2R-printed SWCNT-TFT array is the lack of a suitable, simple, and rapid method for measuring the uniformity of printed products. We developed a probing instrument for characterizing R2R gravure printed TFT, named PICR2R-TFT, for rapidly characterizing R2R-printed SWCNT-TFT array that can present a geographical distribution profile to pinpoint the failed devices in an SWCNT-TFT array. Using the newly developed PICR2R-TFT instrument, the current-voltage characteristics of the fabricated SWCNT-TFT devices could be correlated to various R2R-printing process parameters, such as channel length, roll printing length, and printing speed. Thus, by introducing a characterization tool that is reliable and fast, one can quickly optimize the R2R gravure printing conditions to enhance product uniformity, thereby maximizing the yield of printed SWCNT-TFT arrays.

摘要

卷对卷(R2R)凹版印刷工艺有潜力在柔性塑料基板上制造基于单壁碳纳米管(SWCNT)的薄膜晶体管(TFT)阵列。R2R印刷的SWCNT-TFT阵列商业化的一个重大障碍是缺乏一种合适、简单且快速的方法来测量印刷产品的均匀性。我们开发了一种用于表征R2R凹版印刷TFT的探测仪器,名为PICR2R-TFT,用于快速表征R2R印刷的SWCNT-TFT阵列,该仪器可以呈现地理分布轮廓,以找出SWCNT-TFT阵列中的故障器件。使用新开发的PICR2R-TFT仪器,所制造的SWCNT-TFT器件的电流-电压特性可以与各种R2R印刷工艺参数相关联,如沟道长度、卷式印刷长度和印刷速度。因此,通过引入一种可靠且快速的表征工具,人们可以快速优化R2R凹版印刷条件,以提高产品均匀性,从而使印刷的SWCNT-TFT阵列的产量最大化。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/8779/9920362/fbd1364d3d80/nanomaterials-13-00590-g001.jpg

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