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用于中子探测器应用的硼膜亚皮秒脉冲激光沉积

Sub-ps Pulsed Laser Deposition of Boron Films for Neutron Detector Applications.

作者信息

De Giorgi Maria Luisa, Aziz Muhammad Rizwan, Manousaki Alexandra, Perrone Alessio, Klini Argyro

机构信息

Dipartimento di Matematica e Fisica "E. De Giorgi", Università del Salento, 73100 Lecce, Italy.

INFN-Istituto Nazionale di Fisica Nucleare, 73100 Lecce, Italy.

出版信息

Materials (Basel). 2023 Feb 11;16(4):1512. doi: 10.3390/ma16041512.

Abstract

In view of the demand for high-quality thermal neutron detectors, boron films have recently attracted widespread research interest because of their special properties. In this work, we report on the deposition of boron films on silicon substrates by sub-picosecond pulsed laser deposition (PLD) at room temperature. Particular emphasis was placed on the investigation of the effect of the laser energy density (fluence) on the ablation process of the target material, as well as on the morphological properties of the resulting films. In addition, based on the study of the ablation and deposition rates as a function of the fluence, the ablation/deposition mechanisms are discussed. We show that well-adherent and stable boron films, with good quality surfaces revealing a good surface flatness and absence of cracks, can be obtained by means of the PLD technique, which proves to be a reliable and reproducible method for the fabrication of thick boron coatings that are suitable for neutron detection technology.

摘要

鉴于对高质量热中子探测器的需求,硼膜因其特殊性能最近引起了广泛的研究兴趣。在这项工作中,我们报道了在室温下通过亚皮秒脉冲激光沉积(PLD)在硅衬底上沉积硼膜。特别强调了研究激光能量密度(通量)对靶材烧蚀过程的影响,以及对所得薄膜形态特性的影响。此外,基于对烧蚀和沉积速率作为通量函数的研究,讨论了烧蚀/沉积机制。我们表明,通过PLD技术可以获得附着力良好且稳定的硼膜,其高质量表面具有良好的表面平整度且无裂纹,这证明该技术是一种可靠且可重复的方法,可用于制造适用于中子探测技术的厚硼涂层。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/47ee/9966934/cbcb967502c8/materials-16-01512-g001.jpg

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