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用于位移传感器的相调制衍射光栅的误差分析与实现。

Error analysis and realization of a phase-modulated diffraction grating used as a displacement sensor.

出版信息

Opt Express. 2023 Feb 27;31(5):7907-7921. doi: 10.1364/OE.476203.

Abstract

A grating-based interferometric cavity produces coherent diffraction light field in a compact size, serving as a promising candidate for displacement measurement by taking advantage of both high integration and high accuracy. Phase-modulated diffraction gratings (PMDGs) make use of a combination of diffractive optical elements, allowing for the diminishment of zeroth-order reflected beams and thus improving the energy utilization coefficient and sensitivity of grating-based displacement measurements. However, conventional PMDGs with submicron-scale features usually require demanding micromachining processes, posing a significant challenge to manufacturability. Involving a four-region PMDG, this paper establishes a hybrid error model including etching error and coating error, thus providing a quantitative analysis of the relation between the errors and optical responses. The hybrid error model and the designated process-tolerant grating are experimentally verified by micromachining and grating-based displacement measurements using an 850 nm laser, confirming the validity and effectiveness. It is found the PMDG achieves an energy utilization coefficient (the ratio of the peak-to-peak value of the ±1st order beams to the 0th-order beam) improvement of nearly 500% and a four-fold reduction in 0th-order beam intensity compared with the traditional amplitude grating. More importantly, this PMDG maintains very tolerant process requirements, and the etching error and coating error can be up to 0.5 µm and 0.6 µm, respectively. This offers attractive alternatives to the fabrication of PMDGs and grating-based devices with wide process compatibility. This work first systematically investigates the influence of fabrication errors and identifies the interplay between the errors and the optical response for PMDGs. The hybrid error model allows further avenues for the fabrication of diffraction elements with practical limitations of micromachining fabrication.

摘要

基于光栅的干涉腔在紧凑的尺寸内产生相干衍射光场,利用高集成度和高精度,成为一种有前途的位移测量候选方案。相位调制衍射光栅 (PMDG) 利用衍射光学元件的组合,减小了零级反射光束,从而提高了基于光栅的位移测量的能量利用系数和灵敏度。然而,具有亚微米级特征的传统 PMDG 通常需要苛刻的微加工工艺,这对制造性构成了重大挑战。本文涉及一种四区域 PMDG,建立了包括刻蚀误差和涂层误差的混合误差模型,从而对误差与光学响应之间的关系进行了定量分析。通过微加工和基于光栅的位移测量,使用 850nm 激光对混合误差模型和指定的耐工艺光栅进行了实验验证,证实了其有效性和有效性。结果表明,与传统振幅光栅相比,PMDG 实现了近 500%的能量利用系数(±1 阶光束的峰峰值与 0 阶光束之比)的提高和 0 阶光束强度的四倍降低。更重要的是,这种 PMDG 保持了非常宽容的工艺要求,刻蚀误差和涂层误差分别可达 0.5μm 和 0.6μm。这为具有宽工艺兼容性的 PMDG 和基于光栅的器件的制造提供了有吸引力的替代方案。这项工作首次系统地研究了制造误差的影响,并确定了 PMDG 中误差与光学响应之间的相互作用。混合误差模型为具有实用微加工制造限制的衍射元件的制造提供了进一步的途径。

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