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手性放大的分子起源:天冬氨酸在 Cu(111)上的二维单层。

Molecular Origins of Chiral Amplification on an Achiral Surface: 2D Monolayers of Aspartic Acid on Cu(111).

机构信息

Department of Chemistry, Tufts University, Medford, Massachusetts 02155-5813, United States.

出版信息

ACS Nano. 2023 Mar 28;17(6):5799-5807. doi: 10.1021/acsnano.2c12312. Epub 2023 Mar 6.

Abstract

Recent experiments have demonstrated an intriguing phenomenon in which adsorption of a nonracemic mixture of aspartic acid (Asp) enantiomers onto an achiral Cu(111) metal surface leads to autoamplification of surface enantiomeric excess, , to values well above those of the impinging gas mixtures, . This is particularly interesting because it demonstrates that a slightly nonracemic mixture of enantiomers can be further purified simply by adsorption onto an achiral surface. In this work, we seek a deeper understanding of this phenomena and apply scanning tunneling microscopy to image the overlayer structures formed by mixed monolayers of d- and l-Asp on Cu(111) over the full range of surface enantiomeric excess; = -1 (pure l-Asp) through = 0 (racemic dl-Asp) to = 1 (pure d-Asp). Both enantiomers of three chiral monolayer structures are observed. One is a conglomerate (enantiomerically pure), another is a racemate (equimolar mixture of d- and l-Asp); however, the third structure accommodates both enantiomers in a 2:1 ratio. Such solid phases of enantiomer mixtures with nonracemic composition are rare in 3D crystals of enantiomers. We argue that, in 2D, the formation of chiral defects in a lattice of one enantiomer is easier than in 3D, simply because the stress associated with the chiral defect in a 2D monolayer of the opposite enantiomer can be dissipated by strain into the space above the surface.

摘要

最近的实验表明了一个有趣的现象,即外消旋的天冬氨酸(Asp)混合物在非手性的 Cu(111)金属表面的吸附会导致表面对映体过量的自动放大,达到高于撞击气体混合物的值,。这是特别有趣的,因为它表明,一个稍微非外消旋的对映体混合物可以通过吸附到非手性表面来进一步纯化。在这项工作中,我们寻求更深入地了解这一现象,并应用扫描隧道显微镜来成像由 d-和 l-Asp 混合单层在 Cu(111)上形成的覆盖层结构,表面对映体过量的范围从 = -1(纯 l-Asp)到 = 0(外消旋 dl-Asp)到 = 1(纯 d-Asp)。观察到三种手性单层结构的两种对映体。一种是聚集体(对映体纯),另一种是外消旋体(d-和 l-Asp 的等摩尔混合物);然而,第三种结构以 2:1 的比例容纳两种对映体。这种非外消旋组成的对映体混合物的固相在对映体的 3D 晶体中很少见。我们认为,在 2D 中,一个手性格子中手性缺陷的形成比在 3D 中更容易,这仅仅是因为与 2D 单层中相反手性的手性缺陷相关的应力可以通过应变耗散到表面上方的空间中。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/ef21/10062026/3c2d79ea0608/nn2c12312_0001.jpg

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