Cheng Xiang, Xu Shun, Liu Yan, Cao Yingchao, Xie Huikai, Ye Jinhui
School of Aerospace Engineering, Xiamen University, Xiamen 361005, China.
Key Laboratory of Sensor Technology of Fujian Universities and Colleges, Xiamen 361005, China.
Micromachines (Basel). 2023 Feb 27;14(3):561. doi: 10.3390/mi14030561.
Micro-electro-mechanical system (MEMS) scanning micromirrors are playing an increasingly important role in active structured light systems. However, the initial phase error of the structured light generated by a scanning micromirror seriously affects the accuracy of the corresponding system. This paper reports an optoelectronic integrated sensor with high irradiance responsivity and high linearity that can be used to correct the phase error of the micromirror. The optoelectronic integrated sensor consists of a large-area photodetector (PD) and a receiving circuit, including a post amplifier, an operational amplifier, a bandgap reference, and a reference current circuit. The optoelectronic sensor chip is fabricated in a 180 nm CMOS process. Experimental results show that with a 5 V power supply, the optoelectronic sensor has an irradiance responsivity of 100 mV/(μW/cm) and a -3 dB bandwidth of 2 kHz. The minimal detectable light power is about 19.4 nW, which satisfies the requirements of many active structured light systems. Through testing, the application of the chip effectively reduces the phase error of the micromirror to 2.5%.
微机电系统(MEMS)扫描微镜在有源结构光系统中发挥着越来越重要的作用。然而,扫描微镜产生的结构光的初始相位误差严重影响相应系统的精度。本文报道了一种具有高辐照度响应度和高线性度的光电集成传感器,可用于校正微镜的相位误差。该光电集成传感器由大面积光电探测器(PD)和接收电路组成,接收电路包括后置放大器、运算放大器、带隙基准和参考电流电路。该光电传感器芯片采用180 nm CMOS工艺制造。实验结果表明,在5 V电源供电下,该光电传感器的辐照度响应度为100 mV/(μW/cm),-3 dB带宽为2 kHz。最小可探测光功率约为19.4 nW,满足许多有源结构光系统的要求。通过测试,该芯片的应用有效地将微镜的相位误差降低到2.5%。