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钴/六方氮化硼界面处强Dzyaloshinskii-Moriya相互作用的证据。

Evidence of Strong Dzyaloshinskii-Moriya Interaction at the Cobalt/Hexagonal Boron Nitride Interface.

作者信息

El-Kerdi Banan, Thiaville André, Rohart Stanislas, Panigrahy Sujit, Brás Nuno, Sampaio João, Mougin Alexandra

机构信息

Université Paris-Saclay, CNRS, Laboratoire de Physique des Solides, 91405 Orsay, France.

出版信息

Nano Lett. 2023 Apr 26;23(8):3202-3208. doi: 10.1021/acs.nanolett.2c04985. Epub 2023 Apr 13.

DOI:10.1021/acs.nanolett.2c04985
PMID:37053437
Abstract

The Dzyaloshinskii-Moriya interaction (DMI) and perpendicular magnetic anisotropy (PMA) were measured on four series of Co films (1-2.2 nm thick) grown on Pt or Au and covered with h-BN or Cu. Clean h-BN/Co interfaces were obtained by exfoliating h-BN and transferring it onto the Co film in situ in the ultra-high-vacuum evaporation chamber. By comparing h-BN and Cu-covered samples, the DMI induced by the Co/h-BN interface was extracted and found to be comparable in strength to that of the Pt/Co interface, one of the largest known values. The strong observed DMI despite the weak spin-orbit interaction in h-BN supports a Rashba-like origin in agreement with recent theoretical results. Upon combination of it with Pt/Co in Pt/Co/h-BN heterostructures, even stronger PMA and DMI are found which stabilizes skyrmions at room temperature and a low magnetic field.

摘要

在生长于铂或金上且覆盖有六方氮化硼(h-BN)或铜的四个系列钴薄膜(厚度为1 - 2.2纳米)上测量了Dzyaloshinskii-Moriya相互作用(DMI)和垂直磁各向异性(PMA)。通过在超高真空蒸发室中原位剥落六方氮化硼并将其转移到钴薄膜上,获得了清洁的六方氮化硼/钴界面。通过比较覆盖六方氮化硼和铜的样品,提取出由钴/六方氮化硼界面诱导的DMI,发现其强度与铂/钴界面相当,而铂/钴界面是已知最大的值之一。尽管六方氮化硼中的自旋轨道相互作用较弱,但观察到的强DMI支持了与近期理论结果一致的类Rashba起源。在铂/钴/六方氮化硼异质结构中将其与铂/钴结合时,发现了更强的PMA和DMI,这在室温及低磁场下稳定了斯格明子。

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