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单层石墨烯带隙的电化学调控:从半金属到半导体

Electrochemical regulation of the band gap of single layer graphene: from semimetal to semiconductor.

作者信息

Zeng Lanping, Song Weiying, Jin Xiangfeng, He Quanfeng, Han Lianhuan, Wu Yuan-Fei, Lagrost Corinne, Leroux Yann, Hapiot Philippe, Cao Yang, Cheng Jun, Zhan Dongping

机构信息

State Key Laboratory of Physical Chemistry of Solid Surfaces (PCOSS), Fujian Science & Technology Innovation Laboratory for Energy Materials of China, Engineering Research Center of Electrochemical Technologies of Ministry of Education, Department of Chemistry, College of Chemistry and Chemical Engineering, Department of Mechanical and Electrical Engineering, School of Aerospace Engineering, Xiamen University Xiamen 361005 China

Univ. Rennes, CNRS, ISCR - UMR 6226 35000 Rennes France.

出版信息

Chem Sci. 2023 Mar 17;14(17):4500-4505. doi: 10.1039/d2sc06800a. eCollection 2023 May 3.

Abstract

As a semimetal with a zero band gap and single-atom-scale thickness, single layer graphene (SLG) has excellent electron conductivity on its basal plane. If the band gap could be opened and regulated controllably, SLG would behave as a semiconductor. That means electronic elements or even electronic circuits with single-atom thickness could be expected to be printed on a wafer-scale SLG substrate, which would bring about a revolution in Moore's law of integrated circuits, not by decreasing the feature size of line width, but by piling up the atomic-scale-thickness of an SLG circuit board layer by layer. Employing scanning electrochemical microscopy (SECM), we have demonstrated that the electrochemically induced brominating addition reaction can open and regulate the band gap of SLG by forming SLG bromide (SLGBr). The SLG/SLGBr/SLG Schottky junction shows excellent performance in current rectification, and the rectification potential region can be regulated by tuning the degree of bromination of SLG. This work provides a feasible and effective way to regulate the band gap of SLG, which would open new applications for SLG in micro-nano electronics and ultra-large-scale integrated circuits (ULSI).

摘要

作为一种具有零带隙和单原子尺度厚度的半金属,单层石墨烯(SLG)在其基面上具有优异的电子导电性。如果能可控地打开并调节其带隙,SLG将表现为半导体。这意味着有望在晶圆级SLG衬底上印制具有单原子厚度的电子元件甚至电子电路,这将给集成电路的摩尔定律带来一场革命,不是通过减小线宽的特征尺寸,而是通过逐层堆积SLG电路板的原子尺度厚度来实现。利用扫描电化学显微镜(SECM),我们已经证明,电化学诱导的溴化加成反应可以通过形成石墨烯溴化物(SLGBr)来打开并调节SLG的带隙。SLG/SLGBr/SLG肖特基结在电流整流方面表现出优异性能,并且整流电位区域可以通过调节SLG的溴化程度来调控。这项工作为调节SLG带隙提供了一种可行且有效的方法,这将为SLG在微纳电子学和超大规模集成电路(ULSI)中开辟新的应用。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/babc/10155903/3d5f3906b0cf/d2sc06800a-f1.jpg

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