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可调节二维表面铋掺入的砷化铟纳米片。

Tuneable 2D surface Bismuth incorporation on InAs nanosheets.

机构信息

NanoLund & Department of Physics, Lund University, Box 118, 22100 Lund, Sweden.

Department of Physics and Astronomy, Materials Theory, Box 516, 751 20 Uppsala, Sweden.

出版信息

Nanoscale. 2023 Jun 1;15(21):9551-9559. doi: 10.1039/d3nr00454f.

DOI:10.1039/d3nr00454f
PMID:37190857
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC10234255/
Abstract

The chemical bonding at the interface between compound semiconductors and metals is central in determining electronic and optical properties. In this study, new opportunities for controlling this are presented for nanostructures. We investigate Bi adsorption on 2D wurtzite InAs (112̄0) nanosheets and find that temperature-controlled Bi incorporation in either anionic- or cationic-like bonding is possible in the easily accesible range between room temperature and 400 °C. This separation could not be achieved for ordinary zinc blende InAs(110) surfaces. As the crystal structures of the two surfaces have identical nearest neighbour configurations, this indicates that overall geometric differences can significantly alter the adsorption and incorporation. theoretical modelling confirms observed adsorption results, but indicate that both the formation energies as well as kinetic barriers contributes to the observed temperature dependent behaviour. Further, we find that the Bi adsorption rate can differ by at least 2.5 times between the two InAs surfaces while being negligible for standard Si substrates under similar deposition conditions. This, in combination with the observed interface control, provides an excellent opportunity for tuneable Bi integration on 2D InAs nanostructures on standard Si substrates.

摘要

化合物半导体和金属之间界面的化学键合对于决定电子和光学性质至关重要。在这项研究中,为纳米结构提出了控制这种键合的新机会。我们研究了 Bi 在二维纤锌矿 InAs(112̄0)纳米片上的吸附,发现室温至 400°C 之间容易达到的范围内,可以通过温度控制以阴离子或阳离子类似键合的方式实现 Bi 的掺入。对于普通闪锌矿 InAs(110)表面,这是无法实现的。由于这两个表面的晶体结构具有相同的最近邻构型,这表明整体几何差异可显著改变吸附和掺入。理论建模证实了观察到的吸附结果,但表明形成能以及动力学势垒都有助于观察到的温度相关行为。此外,我们发现 Bi 的吸附速率在两种 InAs 表面之间至少相差 2.5 倍,而在类似沉积条件下对于标准 Si 衬底则可以忽略不计。这与观察到的界面控制相结合,为在标准 Si 衬底上的二维 InAs 纳米结构上进行可调谐的 Bi 集成提供了极好的机会。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/6af4/10234255/85f9259c68dd/d3nr00454f-f4.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/6af4/10234255/185989cab92c/d3nr00454f-f1.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/6af4/10234255/6caf72551876/d3nr00454f-f2.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/6af4/10234255/a072cedd8cf5/d3nr00454f-f3.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/6af4/10234255/85f9259c68dd/d3nr00454f-f4.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/6af4/10234255/185989cab92c/d3nr00454f-f1.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/6af4/10234255/6caf72551876/d3nr00454f-f2.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/6af4/10234255/a072cedd8cf5/d3nr00454f-f3.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/6af4/10234255/85f9259c68dd/d3nr00454f-f4.jpg

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本文引用的文献

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Self-selective formation of ordered 1D and 2D GaBi structures on wurtzite GaAs nanowire surfaces.纤锌矿型砷化镓纳米线表面上有序一维和二维镓铋结构的自选择性形成。
Nat Commun. 2021 Oct 13;12(1):5990. doi: 10.1038/s41467-021-26148-4.
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Ultralow contact resistance between semimetal and monolayer semiconductors.半金属与单层半导体之间的超低接触电阻。
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Bismuthene for highly efficient carbon dioxide electroreduction reaction.用于高效二氧化碳电还原反应的铋烯
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Crystal Chemistry and Bonding Patterns of Bismuth-Based Topological Insulators.铋基拓扑绝缘体的晶体化学与键合模式
Inorg Chem. 2020 Mar 16;59(6):3437-3451. doi: 10.1021/acs.inorgchem.9b03461. Epub 2020 Feb 26.
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Dimension Engineering of High-Quality InAs Nanostructures on a Wafer Scale.高质量 InAs 纳米结构的晶圆级尺寸工程。
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