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4H-碳化硅作为微机电系统的声学材料

4H-Silicon Carbide as an Acoustic Material for MEMS.

作者信息

Long Yaoyao, Liu Zhenming, Ayazi Farrokh

出版信息

IEEE Trans Ultrason Ferroelectr Freq Control. 2023 Oct;70(10):1189-1200. doi: 10.1109/TUFFC.2023.3282920. Epub 2023 Oct 17.

Abstract

This article discusses the potential of 4H-silicon carbide (SiC) as a superior acoustic material for microelectromechanical systems (MEMS), particularly for high-performance resonator and extreme environments applications. Through a comparison of the crystalline structure along with the mechanical, acoustic, electrical, and thermal properties of 4H with respect to other SiC polytypes and silicon, it is shown that 4H-SiC possesses salient properties for MEMS applications, including its transverse isotropy and small phonon scattering dissipation. The utility and implementation of bonded SiC on insulator (4H-SiCOI) substrates as an emerging MEMS technology platform are presented. Additionally, this article reports on the temperature-dependent mechanical properties of 4H-SiC, including the temperature coefficient of frequency (TCF) and quality factor ( Q -factor) for Lamé mode resonators. Finally, the 4H-SiC MEMS fabrication including its deep reactive ion etching is discussed. This article provides valuable insights into the potential of 4H-SiC as a mechanoacoustic material and provides a foundation for future research in the field.

摘要

本文讨论了4H碳化硅(SiC)作为微机电系统(MEMS)中一种优质声学材料的潜力,特别是在高性能谐振器和极端环境应用方面。通过比较4H碳化硅与其他SiC多型体和硅的晶体结构以及机械、声学、电学和热学性质,结果表明4H-SiC在MEMS应用中具有显著特性,包括其横向各向同性和低声子散射损耗。介绍了键合绝缘体上碳化硅(4H-SiCOI)衬底作为一种新兴MEMS技术平台的实用性和应用。此外,本文还报道了4H-SiC的温度相关机械性能,包括拉梅模式谐振器的频率温度系数(TCF)和品质因数(Q因子)。最后,讨论了包括其深反应离子刻蚀在内的4H-SiC MEMS制造工艺。本文为4H-SiC作为机械声学材料的潜力提供了有价值的见解,并为该领域的未来研究奠定了基础。

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