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划痕法、赤霉素和氧化石墨烯如何影响鹤望兰的离体建立与发育。

How Scarification, GA and Graphene Oxide Influence the In Vitro Establishment and Development of Strelitzia.

作者信息

Paiva Patrícia Duarte de Oliveira, Silva Diogo Pedrosa Correa da, Silva Bruna Raphaella da, Sousa Israela Pimenta de, Paiva Renato, Reis Michele Valquíria Dos

机构信息

Departamento de Agricultura, Escola de Ciências Agrárias, Universidade Federal de Lavras, Lavras 37200-000, MG, Brazil.

Departamento de Biologia, Instituto de Ciências Naturais, Universidade Federal de Lavras, Lavras 37200-000, MG, Brazil.

出版信息

Plants (Basel). 2023 May 29;12(11):2142. doi: 10.3390/plants12112142.

DOI:10.3390/plants12112142
PMID:37299121
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC10255328/
Abstract

The propagation of strelitzia plants can be carried out in vitro as an alternative to combine the aseptic conditions of the culture medium with the use of strategies to promote germination and controlled abiotic conditions. However, this technique is still limited by the prolonged time and low percentage of seed germination, which is the most viable explant source, due to dormancy. Thus, the objective of this study was to evaluate the influence of chemical and physical scarification processes of seeds combined with gibberellic acid (GA), as well as the effect of graphene oxide in the in vitro cultivation of strelitzia plants. Seeds were subjected to chemical scarification with sulfuric acid for different periods (10 to 60 min) and physical scarification (sandpaper), in addition to a control treatment without scarification. After disinfection, the seeds were inoculated in MS (Murashige and Skoog) medium with 30 g L sucrose, 0.4 g L PVPP (polyvinylpyrrolidone), 2.5 g L Phytagel, and GA at different concentrations. Growth data and antioxidant system responses were measured from the formed seedlings. In another experiment, the seeds were cultivated in vitro in the presence of graphene oxide at different concentrations. The results showed that the highest germination was observed in seeds scarified with sulfuric acid for 30 and 40 min, regardless of the addition of GA. After 60 days of in vitro cultivation, physical scarification and scarification time with sulfuric acid promoted greater shoot and root length. The highest seedling survival was observed when the seeds were immersed for 30 min (86.66%) and 40 min (80%) in sulfuric acid without GA. The concentration of 50 mg L graphene oxide favored rhizome growth, while the concentration of 100 mg L favored shoot growth. Regarding the biochemical data, the different concentrations did not influence MDA (Malondialdehyde) levels, but caused fluctuations in antioxidant enzyme activities.

摘要

鹤望兰植物的繁殖可以在体外进行,作为一种替代方法,将培养基的无菌条件与促进发芽的策略和可控的非生物条件相结合。然而,由于休眠,这种技术仍然受到种子发芽时间长和发芽率低的限制,而种子是最可行的外植体来源。因此,本研究的目的是评估种子的化学和物理擦伤处理与赤霉素(GA)相结合的影响,以及氧化石墨烯在鹤望兰植物体外培养中的作用。种子除了进行不擦伤的对照处理外,还分别用硫酸进行不同时间(10至60分钟)的化学擦伤和物理擦伤(砂纸处理)。消毒后,将种子接种到含有30 g/L蔗糖、0.4 g/L聚乙烯吡咯烷酮(PVPP)、2.5 g/L植物凝胶和不同浓度GA的MS(Murashige和Skoog)培养基中。从形成的幼苗中测量生长数据和抗氧化系统反应。在另一个实验中,种子在不同浓度的氧化石墨烯存在下进行体外培养。结果表明,无论是否添加GA,用硫酸擦伤30分钟和40分钟的种子发芽率最高。体外培养60天后,物理擦伤和硫酸擦伤时间促进了更大的茎和根长度。当种子在无GA的硫酸中浸泡30分钟(86.66%)和40分钟(80%)时,观察到最高的幼苗存活率。50 mg/L的氧化石墨烯浓度有利于根茎生长,而100 mg/L的浓度有利于茎生长。关于生化数据,不同浓度不影响丙二醛(MDA)水平,但导致抗氧化酶活性波动。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/3848/10255328/f6a8e658a08e/plants-12-02142-g009.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/3848/10255328/c8a52f6e2c80/plants-12-02142-g001.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/3848/10255328/9109fd777b2d/plants-12-02142-g002.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/3848/10255328/91d32f47da81/plants-12-02142-g003.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/3848/10255328/24f6565229e0/plants-12-02142-g004a.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/3848/10255328/cf36d381ea87/plants-12-02142-g005.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/3848/10255328/47b3571b3a9b/plants-12-02142-g006.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/3848/10255328/7aae3628fda0/plants-12-02142-g007.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/3848/10255328/0b75149c12a0/plants-12-02142-g008.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/3848/10255328/f6a8e658a08e/plants-12-02142-g009.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/3848/10255328/c8a52f6e2c80/plants-12-02142-g001.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/3848/10255328/9109fd777b2d/plants-12-02142-g002.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/3848/10255328/91d32f47da81/plants-12-02142-g003.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/3848/10255328/24f6565229e0/plants-12-02142-g004a.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/3848/10255328/cf36d381ea87/plants-12-02142-g005.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/3848/10255328/47b3571b3a9b/plants-12-02142-g006.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/3848/10255328/7aae3628fda0/plants-12-02142-g007.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/3848/10255328/0b75149c12a0/plants-12-02142-g008.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/3848/10255328/f6a8e658a08e/plants-12-02142-g009.jpg

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