Huang Hong-Lan, Shi Qi-Kai, Deng Yan, Lei Xiang-Yang, Zhang Qing-Huang, Chen Jin-Ju, Deng Xue-Ran
Research Center of Laser Fusion, China Academy of Engineering Physics, Mianyang 621900, China.
School of Materials and Energy, University of Electronic Science and Technology of China, Chengdu 610054, China.
Nanomaterials (Basel). 2023 Jun 30;13(13):1985. doi: 10.3390/nano13131985.
In order to improve laser transmission efficiency at 1053 nm and 527 nm, a potassium deuterium phosphate (DKDP) crystal (a key component of high-power laser systems) needs a bi-layer antireflection coating system on its incident surface. UV-curable polysiloxane coatings with a refractive index varying from 1.500 to 1.485 were prepared through the polycondensation of a methacryloxy propyl trimethoxylsilane (MPS) monomer with a controllable degree of hydrolysis. Additionally, the influence rule of the coating structure on the refractive index was intensively studied, and the primary factors that dominate the hydrolysis process were discussed. Further refractive index adjustment was achieved using only a small amount of dopant based on the polysiloxane coating with refractive index of 1.485, allowing for high antireflection of the bi-layer coating system at desired wavelengths to be achieved. In addition, high laser damage resistance and remarkable mechanical properties of the coating were simultaneously realized through the incorporation of a minor quantity of dopants, which benefited from the successful modulation of the intrinsic refractive index of the polysiloxane coating.
为了提高1053纳米和527纳米处的激光传输效率,磷酸二氘钾(DKDP)晶体(高功率激光系统的关键部件)在其入射表面需要一个双层减反射涂层系统。通过甲基丙烯酰氧基丙基三甲氧基硅烷(MPS)单体的可控水解缩聚反应,制备了折射率在1.500至1.485之间变化的紫外光固化聚硅氧烷涂层。此外,深入研究了涂层结构对折射率的影响规律,并讨论了主导水解过程的主要因素。基于折射率为1.485的聚硅氧烷涂层,仅使用少量掺杂剂就实现了进一步的折射率调整,从而使双层涂层系统在所需波长处实现高减反射。此外,通过掺入少量掺杂剂,同时实现了涂层的高抗激光损伤性和卓越的机械性能,这得益于聚硅氧烷涂层固有折射率的成功调制。