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用于图案化X射线照明的掩模设计、制造及实验性鬼成像应用。

Mask design, fabrication, and experimental ghost imaging applications for patterned X-ray illumination.

作者信息

Aminzadeh Alaleh, Roberts Lindon, Young Benjamin, Chiang Cheng-I, Svalbe Imants D, Paganin David M, Kingston Andrew M

出版信息

Opt Express. 2023 Jul 17;31(15):24328-24346. doi: 10.1364/OE.495024.

DOI:10.1364/OE.495024
PMID:37475263
Abstract

A set of non-configurable transversely-displaced masks has been designed and fabricated to generate high-quality X-ray illumination patterns for use in imaging techniques such as ghost imaging (GI), ghost projection, and speckle tracking. The designs include a range of random binary and orthogonal patterns, fabricated through a combination of photolithography and gold electroplating techniques. We experimentally demonstrated that a single wafer can be used as an illumination mask for GI, employing individual illumination patterns and also a mixture of patterns, using a laboratory X-ray source. The quality of the reconstructed X-ray ghost images has been characterized and evaluated through a range of metrics.

摘要

已设计并制造出一组不可配置的横向位移掩模,以生成高质量的X射线照明图案,用于诸如鬼成像(GI)、鬼投影和散斑跟踪等成像技术。这些设计包括一系列随机二进制和正交图案,通过光刻和金电镀技术相结合制造而成。我们通过实验证明,使用实验室X射线源,单个晶圆可用作GI的照明掩模,采用单独的照明图案以及图案的混合。已通过一系列指标对重建的X射线鬼图像的质量进行了表征和评估。

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引用本文的文献

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