High-speed polarization-independent plasmonic modulator on a silicon waveguide.

The electrical bandwidth of an electro-optic modulator plays a vital role in determining the throughput of an optical communications link. We propose a broadband plasmonic electro-optic modulator operating at telecommunications wavelengths (λ ∼ 1550 nm), based on free carrier dispersion in indium tin oxide (ITO). The ITO is driven through its epsilon-near-zero point within the accumulation layers of metal-oxide-semiconductor (MOS) structures. The MOS structures are integrated into a pair of coupled metal-insulator-metal (MIM) waveguides aligned on a planarized silicon waveguide. The coupled MIM waveguides support symmetric and asymmetric plasmonic supermodes, excited adiabatically using mode transformation tapers, by the fundamental TM and TE modes of the underlying silicon waveguide, respectively, such that the modulator can operate in either mode as selected by the input polarisation to the silicon waveguide. The modulator has an active section 1.5 to 2 µm long, enabling the modulator to operate as a lumped element to bandwidths exceeding 200 GHz (3 dB electrical, RC-limited). The modulators produce an extinction ratio in the range of 3.5 to 6 dB, and an insertion loss in the range of 4 to 7.5 dB including input/output mode conversion losses. The AC drive voltage is ±1.75 V. The devices comprise only inorganic materials and are realisable using standard deposition, etching and nanolithography techniques.