Ceyhan E, Nishino T, Botteron K N, Miller M I, Ratnanather J T
Dept. of Mathematics, Koç University, 34450, Sarıyer, Istanbul, Turkey.
Dept. of Psychiatry, Washington University School of Medicine, St. Louis, MO 63110, USA.
Stat Interface. 2017;10(2):313-341. doi: 10.4310/sii.2017.v10.n2.a13. Epub 2016 Oct 31.
Morphometric (i.e., shape and size) differences in the anatomy of cortical structures are associated with neurodevelopmental and neuropsychiatric disorders. Such differences can be quantized and detected by a powerful tool called Labeled Cortical Distance Map (LCDM). The LCDM method provides distances of labeled gray matter (GM) voxels from the GM/white matter (WM) surface for specific cortical structures (or tissues). Here we describe a method to analyze morphometric variability in the particular tissue using LCDM distances. To extract more of the information provided by LCDM distances, we perform pooling and censoring of LCDM distances. In particular, we employ Brown-Forsythe (BF) test of homogeneity of variance (HOV) on the LCDM distances. HOV analysis of pooled distances provides an overall analysis of morphometric variability of the LCDMs due to the disease in question, while the HOV analysis of censored distances suggests the location(s) of significant variation in these differences (i.e., at which distance from the GM/WM surface the morphometric variability starts to be significant). We also check for the influence of assumption violations on the HOV analysis of LCDM distances. In particular, we demonstrate that BF HOV test is robust to assumption violations such as the non-normality and within sample dependence of the residuals from the median for pooled and censored distances and are robust to data aggregation which occurs in analysis of censored distances. We recommend HOV analysis as a complementary tool to the analysis of distribution/location differences. We also apply the methodology on simulated normal and exponential data sets and assess the performance of the methods when more of the underlying assumptions are satisfied. We illustrate the methodology on a real data example, namely, LCDM distances of GM voxels in ventral medial prefrontal cortices (VMPFCs) to see the effects of depression or being of high risk to depression on the morphometry of VMPFCs. The methodology used here is also valid for morphometric analysis of other cortical structures.
皮质结构解剖学上的形态测量学差异(即形状和大小)与神经发育和神经精神疾病有关。这种差异可以通过一种名为标记皮质距离图(LCDM)的强大工具进行量化和检测。LCDM方法为特定皮质结构(或组织)提供标记灰质(GM)体素到GM/白质(WM)表面的距离。在此,我们描述一种使用LCDM距离分析特定组织中形态测量变异性的方法。为了提取LCDM距离提供的更多信息,我们对LCDM距离进行合并和审查。具体而言,我们对LCDM距离进行方差齐性的布朗-福赛斯(BF)检验。合并距离的方差齐性分析提供了由于所讨论疾病导致的LCDM形态测量变异性的总体分析,而审查距离的方差齐性分析则表明这些差异中显著变化的位置(即从GM/WM表面到何种距离时形态测量变异性开始显著)。我们还检查了假设违背对LCDM距离方差齐性分析的影响。具体而言,我们证明BF方差齐性检验对于假设违背具有稳健性,例如合并和审查距离中位数残差的非正态性和样本内依赖性,并且对于审查距离分析中出现的数据聚合具有稳健性。我们建议将方差齐性分析作为分布/位置差异分析的补充工具。我们还将该方法应用于模拟的正态和指数数据集,并在更多基本假设得到满足时评估这些方法的性能。我们通过一个实际数据示例说明该方法,即腹内侧前额叶皮质(VMPFC)中GM体素的LCDM距离,以观察抑郁症或高抑郁症风险对VMPFC形态测量的影响。这里使用的方法对于其他皮质结构的形态测量分析也是有效的。