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外延 Kagome 薄膜作为拓扑平带的平台。

Epitaxial Kagome Thin Films as a Platform for Topological Flat Bands.

作者信息

Cheng Shuyu, Nrisimhamurty M, Zhou Tong, Bagués Núria, Zhou Wenyi, Bishop Alexander J, Lyalin Igor, Jozwiak Chris, Bostwick Aaron, Rotenberg Eli, McComb David W, Žutić Igor, Kawakami Roland K

机构信息

Department of Physics, The Ohio State University, Columbus, Ohio 43210, United States.

Department of Physics, University at Buffalo, Buffalo, New York 14260, United States.

出版信息

Nano Lett. 2023 Aug 9;23(15):7107-7113. doi: 10.1021/acs.nanolett.3c01961. Epub 2023 Jul 28.

Abstract

Systems with flat bands are ideal for studying strongly correlated electronic states and related phenomena. Among them, kagome-structured metals such as CoSn have been recognized as promising candidates due to the proximity between the flat bands and the Fermi level. A key next step will be to realize epitaxial kagome thin films with flat bands to enable tuning of the flat bands across the Fermi level via electrostatic gating or strain. Here, we report the band structures of epitaxial CoSn thin films grown directly on the insulating substrates. Flat bands are observed by using synchrotron-based angle-resolved photoemission spectroscopy (ARPES). The band structure is consistent with density functional theory (DFT) calculations, and the transport properties are quantitatively explained by the band structure and semiclassical transport theory. Our work paves the way to realize flat band-induced phenomena through fine-tuning of flat bands in kagome materials.

摘要

具有平带的体系是研究强关联电子态及相关现象的理想体系。其中,诸如CoSn之类的 kagome 结构金属,因其平带与费米能级接近,已被视为很有前景的候选材料。接下来关键的一步将是制备具有平带的外延 kagome 薄膜,以便通过静电门控或应变来调节跨越费米能级的平带。在此,我们报道了直接生长在绝缘衬底上的外延CoSn薄膜的能带结构。利用基于同步加速器的角分辨光电子能谱(ARPES)观测到了平带。该能带结构与密度泛函理论(DFT)计算结果一致,并且其输运性质可由能带结构和半经典输运理论进行定量解释。我们的工作为通过对kagome材料中的平带进行微调来实现平带诱导现象铺平了道路。

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