Kudryashov Sergey, Danilov Pavel, Kuzmin Evgeny, Smirnov Nikita, Gorevoy Alexey, Vins Victor, Pomazkin Daniil, Paholchuk Petr, Muratov Andrey, Kirichenko Alexey, Rodionov Nikolay, Vasil'ev Evgeny
Lebedev Physical Institute, 119991 Moscow, Russia.
LLC VELMAN, 630058 Novosibirsk, Russia.
Micromachines (Basel). 2023 Jul 9;14(7):1397. doi: 10.3390/mi14071397.
Tightly focused 515-nm, 0.3-ps laser pulses modify in a laser filamentation regime the crystalline structure of an Ib-type high-pressure, high-temperature (HPHT) synthesized diamond in a thin-plate form. The modified microregions (micromarks) in the yellow and colorless crystal zones, possessing different concentrations of elementary substitutional nitrogen (N) impurity atoms (C-centers), exhibit their strongly diminished local IR absorption (upon correction to the thickness scaling factor). Simultaneously, local visible-range (400-550 nm) absorption coefficients were increased, and photoluminescence (PL) yield was strongly enhanced in the broad range of 450-800 nm. The strong yellow-red PL enhancement saturates with laser exposure, implying the complete conversion of C-centers into nitrogen-vacancy (NV) ones due to the laser-induced generation of Frenkel "interstitial-vacancy" I-V carbon pairs. The other emerging blue-green (>470 nm) and green-yellow (>500 nm) PL bands were also simultaneously saturated versus the laser exposure. The observed IR/optical absorption and PL spectral changes enlighten the ultrashort pulse laser inscription of NV-based quantum-emitter centers in synthetic diamonds and enable the evaluation of the productivity of their inscription along with the corresponding I-V generation rates.
聚焦紧密的515纳米、0.3皮秒激光脉冲在激光丝形成区域改变了薄片状Ib型高温高压(HPHT)合成金刚石的晶体结构。黄色和无色晶体区域中的改性微区(微痕),含有不同浓度的基本替代氮(N)杂质原子(C中心),在校正厚度缩放因子后,其局部红外吸收显著降低。同时,局部可见范围(400 - 550纳米)的吸收系数增加,并且在450 - 800纳米的宽范围内光致发光(PL)产率显著提高。强烈的黄红色PL增强随着激光照射而饱和,这意味着由于激光诱导产生弗伦克尔“间隙 - 空位”I - V碳对,C中心完全转化为氮空位(NV)中心。其他新出现的蓝绿色(>470纳米)和绿黄色(>500纳米)PL带也同时随着激光照射而饱和。观察到的红外/光学吸收和PL光谱变化揭示了合成金刚石中基于NV的量子发射中心的超短脉冲激光写入,并能够评估其写入效率以及相应的I - V产生率。