Chu Fulu, Liu Jiamin, Guan Zengqiang, Deng Rongyu, Mei Lin, Wu Feixiang
School of Metallurgy and Environment, Engineering Research Center of the Ministry of Education for Advanced Battery Materials, Hunan Provincial Key Laboratory of Nonferrous Value-added Metallurgy, State Key Laboratory of Powder Metallurgy, Central South University, Changsha, 410083, P. R. China.
Adv Mater. 2023 Dec;35(49):e2305470. doi: 10.1002/adma.202305470. Epub 2023 Oct 26.
Li metal anodes are extensively studied owing to their unparalleled advantages in achieving high energy density. However, safety issues originating from dendritic Li growth are always a huge hindrance for applications in Li metal batteries (LMBs). In this study, a functional additive, 4,6-dimethyl-2-mercaptopyrimidine (DMP), which is a typical leveler in the copper electroplating industry, is selected to suppress Li dendrite formation. Various Li-metal-based batteries are systematically investigated and they show stable performances, such as excellent cycling stability above 800 h at 3 mA cm in Li||Li cells and 400 cycles with high coulombic efficiencies (CEs >98%) at 1 mA cm in Li||Cu cells. Furthermore, a comprehensive verification of the protective mechanism induced by the DMP leveling agent shows that the leveler updated the Li solvation structure and occupied the inner Helmholtz plane of the Li anode. The planar DMP molecular layer absorbed on the surface of the Li metal can suppress side reactions and modify the Li deposition behavior via steric hindrance, inducing homogeneous Li deposition. Interestingly, the DMP leveler does not participate in the formation of the solid electrolyte interphase. This study can stimulate further ideas on non-depleting but effective levelers as electrolyte additives for high-performance LMBs.
锂金属阳极因其在实现高能量密度方面具有无与伦比的优势而受到广泛研究。然而,锂枝晶生长引发的安全问题始终是其在锂金属电池(LMBs)应用中的巨大障碍。在本研究中,选择了一种功能性添加剂4,6-二甲基-2-巯基嘧啶(DMP),它是铜电镀行业中一种典型的整平剂,用于抑制锂枝晶的形成。对各种基于锂金属的电池进行了系统研究,它们表现出稳定的性能,例如在Li||Li电池中,在3 mA cm下循环稳定性超过800小时,在Li||Cu电池中,在1 mA cm下具有400次循环且库仑效率高(CE>98%)。此外,对DMP整平剂诱导的保护机制进行的全面验证表明,该整平剂更新了锂溶剂化结构并占据了锂阳极的内亥姆霍兹平面。吸附在锂金属表面的平面DMP分子层可以通过空间位阻抑制副反应并改变锂的沉积行为,从而诱导均匀的锂沉积。有趣的是,DMP整平剂不参与固体电解质界面的形成。这项研究可以激发人们对作为高性能LMBs电解质添加剂的非消耗性但有效的整平剂的进一步思考。