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正电子湮没光谱法证实的空位抑制诱导 Sb 掺杂 GeTe 热电性能的协同优化

Vacancy Suppression Induced Synergetic Optimization of Thermoelectric Performance in Sb-Doped GeTe Evidenced by Positron Annihilation Spectroscopy.

作者信息

Zhang Tingdong, Qi Ning, Su Xianli, Tang Xinfeng, Chen Zhiquan

机构信息

Hubei Nuclear Solid Physics Key Laboratory, Department of Physics, Wuhan University, Wuhan 430072, China.

State Key Laboratory of Advanced Technology for Materials Synthesis and Processing, Wuhan University of Technology, Wuhan 430070, China.

出版信息

ACS Appl Mater Interfaces. 2023 Aug 30;15(34):40665-40675. doi: 10.1021/acsami.3c08779. Epub 2023 Aug 16.

Abstract

Synergetic optimization of the electrical and thermal transport performance of GeTe has been achieved through Sb doping in this work, resulting in a high thermoelectric figure of merit of 2.2 at 723 K. Positron annihilation measurements provided clear evidence that Sb doping in GeTe can effectively suppress the Ge vacancies, and the decrease of vacancy concentration coincides well with the change of hole carrier concentration after Sb doping. The decreased scattering by hole carriers and vacancies causes notable increase in carrier mobility. Despite this, the density of states effective mass is not enhanced by Sb doping, a maximum power factor of 4562 μW m K at 723 K is obtained for GeSbTe with an optimized carrier concentration of ∼3.65 × 10 cm. Meanwhile, the electronic thermal conductivity κ is reduced because of the decreased electrical conductivity σ with the increase of the Sb doping amount. In addition, the lattice thermal conductivity κ is also suppressed due to multiple phonon scattering mechanism, such as the large mass and strain fluctuations by the substitution of Sb for Ge atoms, and also the unique microstructure including grain boundary, nano-pore, and dislocation in the samples. In conclusion, a maximum of 2.2 is gained at 723 K, which contributes to preferable TE property for GeTe-based materials.

摘要

在本工作中,通过锑掺杂实现了碲化锗电学和热学输运性能的协同优化,在723 K时获得了高达2.2的热电优值。正电子湮没测量提供了明确的证据,表明在碲化锗中掺杂锑可以有效抑制锗空位,空位浓度的降低与锑掺杂后空穴载流子浓度的变化很好地吻合。空穴载流子和空位引起的散射减少导致载流子迁移率显著增加。尽管如此,态密度有效质量并未因锑掺杂而增强,对于载流子浓度优化为~3.65×10 cm的锗锑碲,在723 K时获得了4562 μW m K的最大功率因子。同时,由于随着锑掺杂量的增加电导率σ降低,电子热导率κ也降低。此外,由于多种声子散射机制,如用锑取代锗原子导致的大质量和应变波动,以及样品中包括晶界、纳米孔和位错在内的独特微观结构,晶格热导率κ也受到抑制。总之,在723 K时获得了高达2.2的热电优值,这有助于碲化锗基材料具有更好的热电性能。

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