由硼簇阴离子和碳硼烷制备的复合材料及材料

Avdeeva Varvara V, Nikiforova Svetlana E, Malinina Elena A, Sivaev Igor B, Kuznetsov Nikolay T

Kurnakov Institute of General and Inorganic Chemistry, Russian Academy of Sciences, 31 Leninskii Av., Moscow 119991, Russia.

Nesmeyanov Institute of Organoelement Compounds, Russian Academy of Sciences, 28 Vavilov Str., Moscow 119991, Russia.

Materials (Basel). 2023 Sep 6;16(18):6099. doi: 10.3390/ma16186099.

Here, we present composites and materials that can be prepared starting with boron hydride cluster compounds (decaborane, decahydro--decaborate and dodecahydro--dodecaborate anions and carboranes). Recent examples of their utilization as boron protective coatings including using them to synthesize boron carbide, boron nitride, metal borides, metal-containing composites, and neutron shielding materials are discussed. The data are generalized demonstrate the versatile application of materials based on boron cluster anions and carboranes in various fields.

在此，我们展示了可以从硼氢化物簇化合物（癸硼烷、十氢-癸硼酸盐和十二氢-十二硼酸盐阴离子以及碳硼烷）开始制备的复合材料和材料。讨论了它们作为硼防护涂层的最新应用实例，包括使用它们合成碳化硼、氮化硼、金属硼化物、含金属复合材料和中子屏蔽材料。汇总的数据表明了基于硼簇阴离子和碳硼烷的材料在各个领域的广泛应用。