Witzke Katharina, Kensbock Renko, Willsch Caroline Ulrike, Fricke Katja, Bekeschus Sander, Metelmann Hans-Robert
Department of Oral, Maxillofacial, and Plastic Surgery, Greifswald University Medical Center, Sauerbruchstr., 17475 Greifswald, Germany.
Leibniz Institute for Plasma Science and Technology (INP), Felix Hausdorff-Str. 2, 17489 Greifswald, Germany.
Materials (Basel). 2023 Sep 15;16(18):6222. doi: 10.3390/ma16186222.
(1) Background: In dentistry, a reduction in surface roughness is established mostly by conventional mechanical polishing to hinder biofilm adhesion. This is time- and labor-intensive. Plasma electrolytic polishing is believed to be an effective finishing method due to the reduced treatment time and materials used for applications in dentistry. (2) Methods: Co-Cr-Mo dental alloy samples were sandblasted and prepared with either plasma electrolytic or conventional mechanical polishing. Evaluation of the polishing methods was obtained by atomic force microscopy, scanning electron microscopy and energy-dispersive X-ray spectroscopy. (3) Results: The sandblasted samples showed the highest surface roughness (Heraenium Sun 991 ± 288 nm; Wironit 1187 ± 331 nm). Our results show that with plasma electrolytic polishing, Co-Cr-Mo surfaces can be polished with a surface roughness in the nanometer range, comparable to those achieved by conventional mechanical polishing. Conventional mechanical polishing (Heraenium Sun 134 ± 23 nm; Wironit 114 ± 11 nm) provided lower surface roughness values compared to plasma electrolytic polishing (Heraenium Sun 288 ± 94 nm; Wironit 261 ± 49 nm). We anticipate our pilot study as a starting point for future studies to refine process parameters and quantitative microbiological assays. (4) Conclusions: Plasma electrolytic polishing might have a promising future for polishing dental alloys.
(1) 背景：在牙科领域，表面粗糙度的降低主要通过传统机械抛光来实现，以阻碍生物膜附着。这既耗时又费力。由于减少了治疗时间和牙科应用中使用的材料，等离子体电解抛光被认为是一种有效的精加工方法。(2) 方法：对钴铬钼牙科合金样品进行喷砂处理，然后采用等离子体电解抛光或传统机械抛光。通过原子力显微镜、扫描电子显微镜和能量色散X射线光谱对抛光方法进行评估。(3) 结果：喷砂处理后的样品表面粗糙度最高（Heraenium Sun合金为991±288纳米；Wironit合金为1187±331纳米）。我们的结果表明，采用等离子体电解抛光，钴铬钼表面可抛光至纳米级粗糙度，与传统机械抛光所达到的粗糙度相当。与等离子体电解抛光（Heraenium Sun合金为288±94纳米；Wironit合金为261±49纳米）相比，传统机械抛光（Heraenium Sun合金为134±23纳米；Wironit合金为114±11纳米）提供的表面粗糙度值更低。我们预计我们的初步研究可作为未来研究的起点，以优化工艺参数和定量微生物检测方法。(4) 结论：等离子体电解抛光在牙科合金抛光方面可能具有广阔的前景。
