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揭示SiO负极上固体电解质界面的老化过程。

Revealing the aging process of solid electrolyte interphase on SiO anode.

作者信息

Qian Guoyu, Li Yiwei, Chen Haibiao, Xie Lin, Liu Tongchao, Yang Ni, Song Yongli, Lin Cong, Cheng Junfang, Nakashima Naotoshi, Zhang Meng, Li Zikun, Zhao Wenguang, Yang Xiangjie, Lin Hai, Lu Xia, Yang Luyi, Li Hong, Amine Khalil, Chen Liquan, Pan Feng

机构信息

School of Advanced Materials, Peking University, Shenzhen Graduate School, Shenzhen, China.

School of Materials, Sun Yat-sen University, Shenzhen, China.

出版信息

Nat Commun. 2023 Sep 28;14(1):6048. doi: 10.1038/s41467-023-41867-6.

Abstract

As one of the most promising alternatives to graphite negative electrodes, silicon oxide (SiO) has been hindered by its fast capacity fading. Solid electrolyte interphase (SEI) aging on silicon SiO has been recognized as the most critical yet least understood facet. Herein, leveraging 3D focused ion beam-scanning electron microscopy (FIB-SEM) tomographic imaging, we reveal an exceptionally characteristic SEI microstructure with an incompact inner region and a dense outer region, which overturns the prevailing belief that SEIs are homogeneous structure and reveals the SEI evolution process. Through combining nanoprobe and electron energy loss spectroscopy (EELS), it is also discovered that the electronic conductivity of thick SEI relies on the percolation network within composed of conductive agents (e.g., carbon black particles), which are embedded into the SEI upon its growth. Therefore, the free growth of SEI will gradually attenuate this electron percolation network, thereby causing capacity decay of SiO. Based on these findings, a proof-of-concept strategy is adopted to mechanically restrict the SEI growth via applying a confining layer on top of the electrode. Through shedding light on the fundamental understanding of SEI aging for SiO anodes, this work could potentially inspire viable improving strategies in the future.

摘要

作为石墨负极最有前景的替代材料之一,氧化硅(SiO)因其快速的容量衰减而受到阻碍。硅基SiO上的固体电解质界面(SEI)老化被认为是最关键但却最不为人所理解的方面。在此,利用三维聚焦离子束扫描电子显微镜(FIB-SEM)断层成像技术,我们揭示了一种具有疏松内部区域和致密外部区域的异常特征性SEI微观结构,这推翻了普遍认为SEI是均匀结构的观点,并揭示了SEI的演变过程。通过结合纳米探针和电子能量损失谱(EELS),还发现厚SEI的电子导电性依赖于由导电剂(如炭黑颗粒)组成的渗流网络,这些导电剂在SEI生长时嵌入其中。因此,SEI的自由生长将逐渐削弱这种电子渗流网络,从而导致SiO的容量衰减。基于这些发现,采用了一种概念验证策略,通过在电极顶部施加限制层来机械限制SEI的生长。通过深入了解SiO负极SEI老化的基本原理,这项工作可能会在未来激发可行的改进策略。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/ec61/10539371/e8320765f88c/41467_2023_41867_Fig1_HTML.jpg

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