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校准循环应力下植入物与基台之间微空间的大肠杆菌细胞活性及额部三区评估

Escherichia coli Cellular Activity and Frontal Trizonal Evaluation of Microspace Between Implants and Abutments Under Calibrated Cyclic Stress.

作者信息

Rajadurai Anantha Nayagi Thivya, Ramakrishnan Hariharan, Sampathkumar Jayakrishnakumar, Mahadevan Vallabh, Baskaran Shivakumar, Jeyapalan Vidhya, Ragupathi Maniamuthu

机构信息

Department of Prosthodontics and Implantology, Ragas Dental College and Hospital, Chennai, IND.

Department of Periodontics and Implantology, Ragas Dental College and Hospital, Chennai, IND.

出版信息

Cureus. 2023 Sep 7;15(9):e44816. doi: 10.7759/cureus.44816. eCollection 2023 Sep.

DOI:10.7759/cureus.44816
PMID:37809176
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC10559082/
Abstract

AIM

To evaluate microspace and microleakage between implant and abutments subjected to pre- and post-calibrated cyclic stress.

MATERIALS AND METHODS

Twelve screw-retained implant prostheses with BioHPP polyetheretherketone (PEEK) abutment (Noris Dental Implant System Ltd., Nesher, Israel) (Group I) and 12 screw-retained implant prostheses with computer-assisted design/computer-assisted manufacturing (CAD/CAM) milled zirconia abutment (DentGallop, Houston, TX, USA) (Group II) were connected to their respective implant, and the prosthetic screw was torqued to 30N/cm (Noris). The microspace was evaluated using scanning electron microscopy (SEM; TeScan, Brno, Czech Republic). Twenty-four samples were then induced to cyclic stress (Lokesh Industries, Pune, India) simulating 180 days duration of oral stress. The microspaces (Group IA and Group IIB) were measured post-cyclic stress. Group I and II were again renamed into Group Ia and Group IIb for microbial study. Both implant assemblies were immersed in fresh soybean casein digest broth (SCDB) (Himedia, Mumbai, India) and subsequently inoculated with 1.0µL E. coli suspension (Himedia) at the open end and incubated at 37ºC for seven days. After the incubation period, cellular activity was determined by the spread plate method, and total colony-forming units (CFU) were calculated. The results were evaluated using independent T and Mann-Whitney tests.

RESULT

Average and microspace at the implant-abutment junction of Group I samples in the front right was 12.98µm, center 13.76µm, front left 13.22µm, and in Group II samples, the front right was 18.52µm, center 17.84µm, front left 18.58µm.After being subjected to cyclic loading, the mean levels of the vertical microgap for Group IA samples were: in the front right region 10.37µm, in the center 9.34µm, in the front left 10.51µm and in Group IIB samples front right was 14.59µm, center 13.39µm, front left 13.8µm. Independent t-tests showed insignificant differences between the two groups. The median value of microbial leakage of Group Ia samples after cyclic loading was 30 x 10 CFU/ml, and Group IIb samples were 42 x 10 CFU/ml and were significant.

CONCLUSION

There was minimal variation in the mean microspace between the BioHPP PEEK abutment and CAD/CAM milled zirconia abutment, and it was insignificant before and after cyclic stress. BioHPP PEEK abutment-titanium implant interfaces showed significantly decreased microbial leakage than CAD/CAM milled zirconia abutment-titanium implant interfaces after cyclic stress.

摘要

目的

评估经过预校准和后校准循环应力作用的种植体与基台之间的微间隙和微渗漏情况。

材料与方法

12个采用BioHPP聚醚醚酮(PEEK)基台的螺丝固位种植修复体(Noris牙科种植系统有限公司,内舍尔,以色列)(第一组)和12个采用计算机辅助设计/计算机辅助制造(CAD/CAM)铣削氧化锆基台的螺丝固位种植修复体(DentGallop,美国得克萨斯州休斯顿)(第二组)分别连接至各自的种植体,修复螺丝扭矩至30N/cm(Noris)。使用扫描电子显微镜(SEM;TeScan,捷克布尔诺)评估微间隙。然后对24个样本施加模拟180天口腔应力持续时间的循环应力(Lokesh工业公司,印度浦那)。在循环应力作用后测量微间隙(第一组A和第二组B)。第一组和第二组再次重新命名为第一组a和第二组b用于微生物研究。将两个种植体组件浸入新鲜的大豆酪蛋白消化肉汤(SCDB)(印度希美迪公司,孟买)中,随后在开口端接种1.0µL大肠杆菌悬液(希美迪公司),并在37ºC孵育7天。孵育期结束后,通过平板涂布法测定细胞活性,并计算总菌落形成单位(CFU)。使用独立样本t检验和曼-惠特尼检验评估结果。

结果

第一组样本右前种植体-基台交界处的平均微间隙为12.98µm,中间为13.76µm,左前为13.22µm;第二组样本右前为18.52µm,中间为17.84µm,左前为18.58µm。在承受循环载荷后,第一组A样本垂直微间隙的平均水平为:右前区域10.37µm,中间9.34µm,左前10.51µm;第二组B样本右前为14.59µm,中间为13.39µm,左前为13.8µm。独立样本t检验显示两组之间差异不显著。循环加载后,第一组a样本微生物渗漏的中位数为30×10 CFU/ml,第二组b样本为42×10 CFU/ml,差异显著。

结论

BioHPP PEEK基台与CAD/CAM铣削氧化锆基台之间的平均微间隙变化极小,在循环应力前后均不显著。循环应力后,BioHPP PEEK基台-钛种植体界面的微生物渗漏显著低于CAD/CAM铣削氧化锆基台-钛种植体界面。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/635f/10559082/2272fe436645/cureus-0015-00000044816-i09.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/635f/10559082/312dab1c0445/cureus-0015-00000044816-i01.jpg
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https://cdn.ncbi.nlm.nih.gov/pmc/blobs/635f/10559082/8cff98cbfdb4/cureus-0015-00000044816-i07.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/635f/10559082/7fd0aa84b0c7/cureus-0015-00000044816-i08.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/635f/10559082/2272fe436645/cureus-0015-00000044816-i09.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/635f/10559082/312dab1c0445/cureus-0015-00000044816-i01.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/635f/10559082/44db20a72e4b/cureus-0015-00000044816-i02.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/635f/10559082/4bd9dffa8e43/cureus-0015-00000044816-i03.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/635f/10559082/a5ade906a00e/cureus-0015-00000044816-i04.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/635f/10559082/af422cb9ab90/cureus-0015-00000044816-i05.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/635f/10559082/9b4e1b9b47ae/cureus-0015-00000044816-i06.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/635f/10559082/8cff98cbfdb4/cureus-0015-00000044816-i07.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/635f/10559082/7fd0aa84b0c7/cureus-0015-00000044816-i08.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/635f/10559082/2272fe436645/cureus-0015-00000044816-i09.jpg

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