Wei Jiahui, Yu Hao, He Qianming, Wu Duanduan, Xie Ying, Lin Changgui
Opt Express. 2023 Sep 25;31(20):32591-32600. doi: 10.1364/OE.495083.
Materials based on group IV chalcogenides, are considered to be one of the most promising materials for high-performance, broadband photodetectors due to their wide bandgap coverage, intriguing chemical bonding and excellent physical properties. However, the reported photodetectors based on SnS are still worked at relatively narrow near-infrared band (as far as 1550 nm) hampered by the nonnegligible bandgap of 1.1-1.5 eV. Here, a novel photodetector based on Te alloyed SnS thin film was demonstrated with an ultra-broadband response up to 10.6 µm. By controlling the Te alloyed concentration in SnS increasing to 37.64%, the bandgap narrows to 0.23 eV, exhibiting a photoresponse potential at long-wavelength infrared excitation. Our results show Te-alloying can remarkably enhance the detection properties of SnS/Te photodetectors. The photoresponsivity and detectivity of 1.59 mA/W and 2.3 × 10 Jones were realized at 10.6 µm at room temperature. Moreover, the nonzero photogain was observed generated by nonlinearly increased photocurrent density, resulting in a superlinear dependency between photoresponsivity and light intensity. Our studies successfully broaden photoresponse spectrum of SnS toward the mid-infrared range for the first time. It also suggests that alloying is an effective technique for tuning the band edges of group IV chalcogenides, contributing deep implications for developing future optoelectronic applications.
基于IV族硫族化物的材料,因其宽带隙覆盖、有趣的化学键合和优异的物理性能,被认为是高性能宽带光电探测器最有前途的材料之一。然而,报道的基于SnS的光电探测器仍在相对较窄的近红外波段(截至1550 nm)工作,受到1.1 - 1.5 eV不可忽略的带隙的限制。在此,展示了一种基于碲合金化SnS薄膜的新型光电探测器,其具有高达10.6 µm的超宽带响应。通过将SnS中碲合金化浓度控制增加到37.64%,带隙缩小到0.23 eV,在长波长红外激发下表现出光响应潜力。我们的结果表明碲合金化可以显著提高SnS/Te光电探测器的探测性能。在室温下,在10.6 µm处实现了1.59 mA/W的光响应度和2.3×10琼斯的探测率。此外,观察到由非线性增加的光电流密度产生的非零光增益,导致光响应度与光强之间呈现超线性依赖关系。我们的研究首次成功地将SnS的光响应光谱拓宽到中红外范围。这也表明合金化是调节IV族硫族化物带边的有效技术,对未来光电子应用的发展具有深远意义。