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短沟道器件双栅碳纳米管场效应晶体管特性的优化

Optimization of Double-Gate Carbon Nanotube FET Characteristics for Short Channel Devices.

作者信息

Moorthy Vijai M, Venkatesan Rethinasamy, Srivastava Viranjay M

机构信息

Department of Electronic Engineering, Howard College, University of KwaZulu-Natal, Durban, South Africa.

Department of Biomedical Engineering, E.G.S. Pillay Engineering College, Nagapattinam, India.

出版信息

Recent Pat Nanotechnol. 2025;19(1):148-155. doi: 10.2174/1872210517666230622123317.

Abstract

INTRODUCTION

Transistors are the fundamental electronic component integrated into electronic devices' chips Carbon Nano Tube (CNT) based field.

METHODS

Effect Transistor (FET) is a promising component for next-generation transistor technologies; as it has high carrier mobility, device stability, and mechanical flexibility. Nevertheless, some shortcomings in the CNT FET's design prevent it from providing the best performance while preserving thermal stability.

RESULTS

The structure and functionality of transistors with Double-Gate (DG) devices, which use carbon nanotubes as active channel regions, have been examined by the authors of this study. The DG CNT FET has been extensively simulated using an electronic device simulator with various device geometrics, including channel length, oxide thickness for its output, and transfer characteristics. In comparison to reported patents and published works, this demonstrates a significant improvement.

CONCLUSION

A new perspective on the DG CNT FET's device performance characteristics is provided by this research work, which can be scaled down to minimum channel length without Short Channel Effects (SCEs).

摘要

引言

晶体管是集成在电子设备芯片碳纳米管(CNT)基场中的基本电子元件。

方法

效应晶体管(FET)是下一代晶体管技术中一种很有前景的元件;因为它具有高载流子迁移率、器件稳定性和机械柔韧性。然而,碳纳米管场效应晶体管(CNT FET)设计中的一些缺点使其在保持热稳定性的同时无法提供最佳性能。

结果

本研究的作者研究了以碳纳米管作为有源沟道区的双栅(DG)器件晶体管的结构和功能。利用电子器件模拟器对DG CNT FET进行了广泛模拟,模拟了各种器件几何参数,包括沟道长度、氧化物厚度对其输出和传输特性的影响。与已报道的专利和发表的作品相比,这显示出了显著的改进。

结论

这项研究工作为DG CNT FET的器件性能特性提供了一个新的视角,该特性可以缩小到最小沟道长度而不会产生短沟道效应(SCEs)。

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