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拓扑绝缘体中的体-局域态密度对应关系。

Bulk-local-density-of-state correspondence in topological insulators.

作者信息

Xie Biye, Huang Renwen, Jia Shiyin, Lin Zemeng, Hu Junzheng, Jiang Yao, Ma Shaojie, Zhan Peng, Lu Minghui, Wang Zhenlin, Chen Yanfeng, Zhang Shuang

机构信息

New Cornerstone Science Laboratory, Department of Physics, The University of Hong Kong, Pokfulam Road, Hong Kong, China.

School of Science and Engineering, The Chinese University of Hong Kong, 518172, Shenzhen, China.

出版信息

Nat Commun. 2023 Nov 14;14(1):7347. doi: 10.1038/s41467-023-42449-2.

DOI:10.1038/s41467-023-42449-2
PMID:37963897
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC10646048/
Abstract

In the quest to connect bulk topological quantum numbers to measurable parameters in real materials, current established approaches often necessitate specific conditions, limiting their applicability. Here we propose and demonstrate an approach to link the non-trivial hierarchical bulk topology to the multidimensional partition of local density of states (LDOS), denoted as the bulk-LDOS correspondence. In finite-size topologically nontrivial photonic crystals, we observe the LDOS partitioned into three distinct regions: a two-dimensional interior bulk area, a one-dimensional edge region, and zero-dimensional corner sites. Contrarily, topologically trivial cases exhibit uniform LDOS distribution across the entire two-dimensional bulk area. Our findings provide a general framework for distinguishing topological insulators and uncovering novel aspects of topological directional band-gap materials, even in the absence of in-gap states.

摘要

在将体拓扑量子数与实际材料中的可测量参数联系起来的探索中,当前已确立的方法通常需要特定条件,这限制了它们的适用性。在此,我们提出并证明了一种将非平凡分层体拓扑与局部态密度(LDOS)的多维划分联系起来的方法,即体-LDOS对应关系。在有限尺寸的拓扑非平凡光子晶体中,我们观察到LDOS被划分为三个不同区域:二维内部体区域、一维边缘区域和零维角点。相反,拓扑平凡的情况在整个二维体区域呈现均匀的LDOS分布。我们的发现为区分拓扑绝缘体和揭示拓扑定向带隙材料的新特性提供了一个通用框架,即使在不存在带隙态的情况下也是如此。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/8393/10646048/a5ccc37b9901/41467_2023_42449_Fig4_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/8393/10646048/0f406e8a8d22/41467_2023_42449_Fig1_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/8393/10646048/f5a3760b36fb/41467_2023_42449_Fig2_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/8393/10646048/5794cee1ed1e/41467_2023_42449_Fig3_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/8393/10646048/a5ccc37b9901/41467_2023_42449_Fig4_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/8393/10646048/0f406e8a8d22/41467_2023_42449_Fig1_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/8393/10646048/f5a3760b36fb/41467_2023_42449_Fig2_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/8393/10646048/5794cee1ed1e/41467_2023_42449_Fig3_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/8393/10646048/a5ccc37b9901/41467_2023_42449_Fig4_HTML.jpg

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本文引用的文献

1
Revealing topology in metals using experimental protocols inspired by K-theory.利用受 K 理论启发的实验方案揭示金属中的拓扑结构。
Nat Commun. 2023 May 27;14(1):3071. doi: 10.1038/s41467-023-38862-2.
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Extended topological valley-locked surface acoustic waves.扩展拓扑谷锁定表面声波
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Circuit implementation of a four-dimensional topological insulator.一种四维拓扑绝缘体的电路实现。
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Experimental characterization of fragile topology in an acoustic metamaterial.实验表征声学超材料中的脆弱拓扑结构。
Science. 2020 Feb 14;367(6479):797-800. doi: 10.1126/science.aaz7654.
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Two-Dimensional Second-Order Topological Insulator in Graphdiyne.二维二维拓扑绝缘体在 Graphdiyne 中。
Phys Rev Lett. 2019 Dec 20;123(25):256402. doi: 10.1103/PhysRevLett.123.256402.
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Visualization of Higher-Order Topological Insulating Phases in Two-Dimensional Dielectric Photonic Crystals.二维介电光子晶体中高阶拓扑绝缘相的可视化
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