Raditoiu Alina, Raditoiu Valentin, Raduly Monica Florentina, Gabor Augusta Raluca, Frone Adriana Nicoleta, Grapin Maria, Anastasescu Mihai
National Research and Development Institute for Chemistry and Petrochemistry-ICECHIM, 202 Splaiul Independentei, 060021 Bucharest, Romania.
Institute of Physical Chemistry "Ilie Murgulescu", 202 Splaiul Independentei, 060021 Bucharest, Romania.
Gels. 2023 Oct 30;9(11):860. doi: 10.3390/gels9110860.
Photocatalytic coatings are difficult to obtain on textile materials because of the sometimes contradictory properties that must be achieved. In order to obtain a high efficiency of a photocatalytic effect, the metal-oxide semiconductor must be found in the vicinity of the coating-air interface in order to come into direct contact with the contaminant species and allow light radiation access to its surface. Another necessary condition is related to the properties of the covering textile material as well as to the stability of the xerogel films to light and wet treatments. In this sense, we proposed a solution based on hybrid silica films generated by sol-gel processes, coatings that contain as a photocatalyst TiO sensitized with tetracarboxylic acid of iron (III) phthalocyanine (FeTCPc). The coatings were made by the pad-dry-cure process, using in the composition a bifunctional anchoring agent (3-glycidoxipropyltrimethoxysilane, GLYMO), a crosslinking agent (sodium tetraborate, BORAX), and a catalyst (N-methylimidazole, MIM) for the polymerization of epoxy groups. The photodegradation experiments performed on methylene blue (MB), utilized as a model contaminant, using LED or xenon arc as light sources, showed that the treatment with BORAX improves the resistance of the coatings to wet treatments but worsens their photocatalytic performances.
由于必须实现的某些相互矛盾的特性,光催化涂层很难在纺织材料上获得。为了获得高效的光催化效果,金属氧化物半导体必须位于涂层-空气界面附近,以便与污染物直接接触,并使光辐射能够照射到其表面。另一个必要条件与覆盖纺织材料的特性以及干凝胶膜对光和湿处理的稳定性有关。从这个意义上说,我们提出了一种基于溶胶-凝胶法生成的混合二氧化硅膜的解决方案,该涂层含有用铁(III)酞菁四羧酸(FeTCPc)敏化的TiO作为光催化剂。涂层通过轧染-烘干-焙烘工艺制备,在组合物中使用双官能锚固剂(3-缩水甘油氧基丙基三甲氧基硅烷,GLYMO)、交联剂(硼砂,BORAX)和用于环氧基团聚合的催化剂(N-甲基咪唑,MIM)。以亚甲基蓝(MB)作为模型污染物,使用LED或氙弧作为光源进行的光降解实验表明,用硼砂处理可提高涂层对湿处理的耐受性,但会降低其光催化性能。