Tanuma Yuri, Kladnik Gregor, Schio Luca, van Midden Mavrič Marion, Anézo Bastien, Zupanič Erik, Bavdek Gregor, Canton-Vitoria Ruben, Floreano Luca, Tagmatarchis Nikos, Wegner Hermann A, Morgante Alberto, Ewels Christopher P, Cvetko Dean, Arčon Denis
Jožef Stefan Institute, Jamova 39, SI-1000 Ljubljana, Slovenia.
Center for Advanced Research of Energy and Materials (CAREM), Hokkaido University, Kita 13, Nishi 8, Kitaku, Sapporo 060-8628, Japan.
ACS Nano. 2023 Dec 26;17(24):25301-25310. doi: 10.1021/acsnano.3c08717. Epub 2023 Dec 12.
We deposit azafullerene CN radicals in a vacuum on the Au(111) surface for layer thicknesses between 0.35 and 2.1 monolayers (ML). The layers are characterized using X-ray photoemission (XPS) and X-ray absorption fine structure (NEXAFS) spectroscopy, low-temperature scanning tunneling microscopy (STM), and by density functional calculations (DFT). The singly unoccupied CN orbital (SUMO) has been identified in the N 1s NEXAFS/XPS spectra of CN layers as a spectroscopic fingerprint of the molecular radical state. At low molecular coverages (up to 1 ML), films of monomeric CN are stabilized with the nonbonded carbon orbital neighboring the nitrogen oriented toward the Au substrate, whereas in-plane intermolecular coupling into diamagnetic (CN) dimers takes over toward the completion of the second layer. By following the CN SUMO peak intensity with increasing molecular coverage, we identify an intermediate high-spin-density phase between 1 and 2 ML, where uncoupled CN monomers in the second layer with pronounced radical character are formed. We argue that the CN radical stabilization of this supramonolayer phase of monomers is achieved by suppressed coupling to the substrate. This results from molecular isolation on top of the passivating azafullerene contact layer, which can be explored for molecular radical state stabilization and positioning on solid substrates.
我们在真空中将氮杂富勒烯氰基自由基沉积在Au(111)表面,形成厚度在0.35至2.1单层(ML)之间的层。使用X射线光电子能谱(XPS)、X射线吸收精细结构(NEXAFS)光谱、低温扫描隧道显微镜(STM)以及密度泛函计算(DFT)对这些层进行表征。在氰基层的N 1s NEXAFS/XPS光谱中,已将单占据的氰基轨道(SUMO)鉴定为分子自由基态的光谱指纹。在低分子覆盖度(高达1 ML)下,单体氰的薄膜通过与氮相邻的未键合碳轨道朝向金基底取向而得以稳定,而在第二层形成过程中,平面内分子间耦合形成抗磁性的(CN)二聚体。通过随着分子覆盖度增加跟踪氰基SUMO峰强度,我们确定了在1至2 ML之间的一个中间高自旋密度相,其中第二层中形成了具有明显自由基特征的未耦合氰单体。我们认为,这种单体超单层相的氰基自由基稳定性是通过抑制与基底的耦合来实现的。这是由于在钝化的氮杂富勒烯接触层顶部的分子隔离导致的,这可用于分子自由基态在固体基底上的稳定和定位研究。