Gholinia A, Donoghue J, Garner A, Curd M, Lawson M J, Winiarski B, Geurts R, Withers P J, Burnett T L
Department of Materials, Henry Royce Institute, The University of Manchester, M13 9PL, UK.
Department of Materials, Henry Royce Institute, The University of Manchester, M13 9PL, UK.
Ultramicroscopy. 2024 Mar;257:113903. doi: 10.1016/j.ultramic.2023.113903. Epub 2023 Dec 5.
Tri-beam microscopes comprising a fs-laser beam, a Xe+ plasma focused ion beam (PFIB) and an electron beam all in one chamber open up exciting opportunities for site-specific correlative microscopy. They offer the possibility of rapid ablation and material removal by fs-laser, subsequent polishing by Xe-PFIB milling and electron imaging of the same area. While tri-beam systems are capable of probing large (mm) volumes providing high resolution microscopical characterisation of 2D and 3D images across exceptionally wide range of materials and biomaterials applications, presenting high quality/low damage surfaces to the electron beam can present a significant challenge, especially given the large parameter space for optimisation. Here the optimal conditions and artefacts associated with large scale volume milling, mini test piece manufacture, serial sectioning and surface polishing are investigated, both in terms of surface roughness and surface quality for metallic, ceramic, mixed complex phase, carbonaceous, and biological materials. This provides a good starting place for those wishing to examine large areas or volumes by tri-beam microscopy across a range of materials.
包含飞秒激光束、Xe+等离子体聚焦离子束(PFIB)和电子束且三者均位于同一腔室的三束显微镜,为特定部位的相关显微镜检查带来了令人兴奋的机遇。它们提供了通过飞秒激光进行快速烧蚀和材料去除、随后通过Xe-PFIB铣削进行抛光以及对同一区域进行电子成像的可能性。虽然三束系统能够探测大体积(毫米级),在极其广泛的材料和生物材料应用中对二维和三维图像进行高分辨率显微镜表征,但要向电子束呈现高质量/低损伤表面可能是一项重大挑战,尤其是考虑到优化的参数空间很大。在此,针对金属、陶瓷、混合复杂相、含碳和生物材料,从表面粗糙度和表面质量方面研究了与大规模体积铣削、微型试件制造、连续切片和表面抛光相关的最佳条件及伪像。这为那些希望通过三束显微镜对一系列材料进行大面积或大体积检查的人提供了一个良好的起点。