Levchenko A B, Shabunov B E, Belousova I I, Simarov B V, Tereshin I M
Genetika. 1979 Jun;15(6):1007-14.
239 nistatin-resistant mutants were selected after UV-irradiation of yeasts. Phenotypical analysis has revealed two main groups of the mutants: 1) resistant to nistatin and resistant or sensitive (in different combinations) to haptaens; 2) resistant to nistatin and having an increased resistance to haptens. It is found that the sensitivity dominates over the resistance and hyper-resistance. Genetic analysis of the mutant collection has shown that the resistance to nistatin is determined by 5 nuclear genes (hysr). Hyper-resistance is controlled by mutations in other genes, which are not connected with stable phenotype. Genes of hyper-resistance can be considered as minus-modificators of pleiothrophic cross-resistance, characteristic of hysr genes. Plus-modificator genes of polyenic resistance are described. The gene hysr1 is linked with its chromosome.
对酵母进行紫外线照射后筛选出了239株制霉菌素抗性突变体。表型分析揭示了两类主要的突变体:1)对制霉菌素抗性且对半抗原抗性或敏感(不同组合);2)对制霉菌素抗性且对半抗原有增强的抗性。发现敏感性在抗性和超抗性中占主导。对突变体库的遗传分析表明,对制霉菌素的抗性由5个核基因(hysr)决定。超抗性由其他基因的突变控制,这些基因与稳定表型无关。超抗性基因可被视为多效交叉抗性的负修饰因子,这是hysr基因的特征。描述了多基因抗性的正修饰因子基因。基因hysr1与其染色体相连。