Hofer Christoph, Gao Chuang, Chennit Tamazouzt, Yuan Biao, Pennycook Timothy J
EMAT, University of Antwerp, Groenenborgerlaan 171, 2020 Antwerp, Belgium; NANOlab Center of Excellence, University of Antwerp, Groenenborgerlaan 171, 2020 Antwerp, Belgium.
EMAT, University of Antwerp, Groenenborgerlaan 171, 2020 Antwerp, Belgium; NANOlab Center of Excellence, University of Antwerp, Groenenborgerlaan 171, 2020 Antwerp, Belgium.
Ultramicroscopy. 2024 Apr;258:113922. doi: 10.1016/j.ultramic.2024.113922. Epub 2024 Jan 8.
The contrast transfer function of direct ptychography methods such as the single side band (SSB) method are single signed, yet these methods still sometimes exhibit contrast reversals, most often where the projected potentials are strong. In thicker samples central focusing often provides the best ptychographic contrast as this leads to defocus variations within the sample canceling out. However focusing away from the entrance surface is often undesirable as this degrades the annular dark field (ADF) signal. Here we discuss how phase wrap asymptotes in the frequency response of SSB ptychography give rise to contrast reversals, without the need for dynamical scattering, and how these can be counteracted by manipulating the phases such that the asymptotes are either shifted to higher frequencies or damped via amplitude modulation. This is what enables post collection defocus correction of contrast reversals. However, the phase offset method of counteracting contrast reversals we introduce here is generally found to be superior to post collection application of defocus, with greater reliability and generally stronger contrast. Importantly, the phase offset method also works for thin and thick samples where central focusing does not. Finally, the independence of the method from focus is useful for optical sectioning involving ptychography, improving interpretability by better disentangling the effects of strong potentials and focus.
诸如单边带(SSB)方法等直接叠层成像方法的对比度传递函数是单符号的,但这些方法有时仍会出现对比度反转,最常见于投影势较强的地方。在较厚的样品中,中心聚焦通常能提供最佳的叠层成像对比度,因为这会使样品内部的散焦变化相互抵消。然而,远离入射表面聚焦通常是不可取的,因为这会降低环形暗场(ADF)信号。在这里,我们讨论了SSB叠层成像频率响应中的相位包裹渐近线如何在无需动态散射的情况下导致对比度反转,以及如何通过操纵相位来抵消这些反转,使得渐近线要么移向更高频率,要么通过幅度调制进行衰减。这就是实现对比度反转的采集后散焦校正的方法。然而,我们在此介绍的抵消对比度反转的相位偏移方法通常被发现优于采集后应用散焦,具有更高的可靠性和通常更强的对比度。重要的是,相位偏移方法也适用于中心聚焦不起作用的薄样品和厚样品。最后,该方法与聚焦的独立性对于涉及叠层成像的光学切片很有用,通过更好地分辨强势和聚焦的影响来提高可解释性。