Preparation and performance of a CsI scintillation screen with a double-period structure based on an oxidized silicon micropore array template.

A structured double-period CsI scintillation screen was successfully developed to improve its detection efficiency based on an oxidized silicon micropore array template with a period value on the order of micro-scale. The structure comprises a main structure along with a sub-structure. The main structure with a period of 8 µm was arranged in a square array consisting of square columnar scintillator units. The micropore walls between the main structure units were purposely fabricated from a SiO-Si-SiO layered structure. The pore walls in commonly used single-structure with a period of 4 µm use the same layered structure composition to obtain a fair comparison. The thickness of both Si and the SiO layers was around 0.4 µm. The unique feature of the double structure lies in the even separation of each unit within the main structure into four square columnar scintillator sub-units. These four sub-units within each sub-structure were isolated solely by SiO layers with a thickness of approximately 0.8 µm. As a result, the X-ray-induced optical luminescence intensity of the double-structure screen exhibited a 31% increase compared to the corresponding single-structure scintillation screen. In X-ray imaging, a spatial resolution of 109 lp/mm was achieved, which closely matched the results obtained with the single-structure CsI screen. Furthermore, the detective quantum efficiency also displayed a notable improvement.