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用于高灵敏度微位移传感器的宽带隙单层二硫化钼的生长

Growth of Wide-Bandgap Monolayer Molybdenum Disulfide for a Highly Sensitive Micro-Displacement Sensor.

作者信息

Wang Shaopeng, Huang Jiahai, Wu Yizhang, Hao Huimin

机构信息

College of Mechanical and Vehicle Engineering, Taiyuan University of Technology, Taiyuan 030024, China.

College of Science, Hohai University, Nanjing 211100, China.

出版信息

Nanomaterials (Basel). 2024 Jan 27;14(3):275. doi: 10.3390/nano14030275.

Abstract

Two-dimensional (2D) piezoelectric semiconductor materials are garnering significant attention in applications such as intelligent sensing and energy harvesting due to their exceptional physical and chemical properties. Among these, molybdenum disulfide (MoS), a 2D wide-bandgap semiconductor, exhibits piezoelectricity in odd-layered structures due to the absence of an inversion symmetry center. In this study, we present a straightforward chemical vapor deposition (CVD) technique to synthesize monolayer MoS on a Si/SiO substrate, achieving a lateral size of approximately 50 µm. Second-harmonic generation (SHG) characterization confirms the non-centrosymmetric crystal structure of the wide-bandgap MoS, indicative of its piezoelectric properties. We successfully transferred the triangular MoS to a polyethylene terephthalate (PET) flexible substrate using a wet-transfer method and developed a wide-bandgap MoS-based micro-displacement sensor employing maskless lithography and hot evaporation techniques. Our testing revealed a piezoelectric response current of 5.12 nA in the sensor under a strain of 0.003% along the armchair direction of the monolayer MoS. Furthermore, the sensor exhibited a near-linear relationship between the piezoelectric response current and the strain within a displacement range of 40-100 µm, with a calculated response sensitivity of 1.154 µA/%. This research introduces a novel micro-displacement sensor, offering potential for advanced surface texture sensing in various applications.

摘要

二维(2D)压电半导体材料因其优异的物理和化学性质,在智能传感和能量收集等应用中受到了广泛关注。其中,二维宽带隙半导体二硫化钼(MoS)由于缺乏反演对称中心,在奇数层结构中表现出压电性。在本研究中,我们提出了一种简单的化学气相沉积(CVD)技术,用于在Si/SiO衬底上合成单层MoS,实现了约50 µm的横向尺寸。二次谐波产生(SHG)表征证实了宽带隙MoS的非中心对称晶体结构,表明其具有压电特性。我们使用湿法转移方法成功地将三角形MoS转移到聚对苯二甲酸乙二酯(PET)柔性衬底上,并采用无掩膜光刻和热蒸发技术开发了一种基于宽带隙MoS的微位移传感器。我们的测试表明,在沿单层MoS扶手椅方向施加0.003%的应变时,传感器中的压电响应电流为5.12 nA。此外,在40-100 µm的位移范围内,传感器的压电响应电流与应变之间呈现出近似线性关系,计算得出的响应灵敏度为1.154 µA/%。本研究介绍了一种新型微位移传感器,为各种应用中的先进表面纹理传感提供了潜力。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/1901/10856534/ec7491ee63a1/nanomaterials-14-00275-g001.jpg

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