Nagai Keita, Sugita Naohiro, Shinshi Tadahiko
Department of Mechanical Engineering, Tokyo Institute of Technology, 4259 Nagatsuta-cho, Midori-ku, Yokohama 226-8503, Japan.
Laboratory for Future Interdisciplinary Research of Science and Technology (FIRST), Institute of Innovative Research (IIR), Tokyo Institute of Technology, 4259 Nagatsuta-cho, Midori-ku, Yokohama 226-8503, Japan.
Micromachines (Basel). 2024 Feb 7;15(2):248. doi: 10.3390/mi15020248.
In magnetic microelectromechanical systems (MEMSs), permanent magnets in the form of a thick film or thin plate are used for structural and manufacturing purposes. However, the geometric shape induces a strong self-demagnetization field during thickness-direction magnetization, limiting the surface magnetic flux density and output power. The magnets must be segmented or magnetized in a fine and multi-pole manner to weaken the self-demagnetization field. Few studies have been performed on fine multi-pole magnetization techniques that can generate a higher surface magnetic flux density than segmented magnets and are suitable for mass production. This paper proposes a batch fine multi-pole magnetic pattern transfer (MPT) method for the magnets of MEMS devices. The proposed method uses two master magnets with identical magnetic patterns to sandwich a target magnet. Subsequently, the coercivity of the target magnet is reduced via heating, and the master magnet's magnetic pattern is transferred to the target magnet. Stripe, checkerboard, and concentric circle patterns with a pole pitch of 0.3 mm are magnetized on the NdFeB master magnets N38EH with high intrinsic coercivity via laser-assisted heating magnetization. The MPT yields the highest surface magnetic flux density at 160 °C, reaching 39.7-66.1% of the ideal magnetization pattern on the NdFeB target magnet N35.
在磁性微机电系统(MEMS)中,厚膜或薄板形式的永磁体用于结构和制造目的。然而,几何形状在厚度方向磁化过程中会产生很强的自退磁场,限制了表面磁通密度和输出功率。磁体必须进行分割或以精细多极方式磁化,以削弱自退磁场。很少有研究针对能够产生比分割磁体更高表面磁通密度且适合大规模生产的精细多极磁化技术。本文提出了一种用于MEMS器件磁体的批量精细多极磁图案转移(MPT)方法。所提出的方法使用两个具有相同磁图案的主磁体夹着一个目标磁体。随后,通过加热降低目标磁体的矫顽力,将主磁体的磁图案转移到目标磁体上。通过激光辅助加热磁化,在具有高固有矫顽力的钕铁硼主磁体N38EH上磁化了极距为0.3mm的条纹、棋盘和同心圆图案。MPT在160°C时产生最高表面磁通密度,达到钕铁硼目标磁体N35上理想磁化图案的39.7 - 66.1%。