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分子水平去除抗生素耐药菌和基因:界面化学在高级氧化过程中的作用综述。

Molecular level removal of antibiotic resistant bacteria and genes: A review of interfacial chemical in advanced oxidation processes.

机构信息

MOE Key Laboratory of Pollution Processes and Environmental Criteria, Tianjin Key Laboratory of Environmental Remediation and Pollution Control, College of Environmental Science and Engineering, Nankai University, Tianjin 300350, PR China.

MOE Key Laboratory of Pollution Processes and Environmental Criteria, Tianjin Key Laboratory of Environmental Remediation and Pollution Control, College of Environmental Science and Engineering, Nankai University, Tianjin 300350, PR China.

出版信息

Water Res. 2024 May 1;254:121373. doi: 10.1016/j.watres.2024.121373. Epub 2024 Feb 23.

DOI:10.1016/j.watres.2024.121373
PMID:38447374
Abstract

As a kind of novel and persistent environmental pollutants, antibiotic resistant bacteria (ARB) and antibiotic resistance genes (ARGs) have been frequently detected in different aquatic environment, posing potential risks to public health and ecosystems, resulting in a biosecurity issue that cannot be ignored. Therefore, in order to control the spread of antibiotic resistance in the environment, advanced oxidation technology (such as Fenton-like, photocatalysis, electrocatalysis) has become an effective weapon for inactivating and eliminating ARB and ARGs. However, in the process of advanced oxidation technology, studying and regulating catalytic active sites at the molecular level and studying the adsorption and surface oxidation reactions between catalysts and ARGs can achieve in-depth exploration of the mechanism of ARGs removal. This review systematically reveals the catalytic sites and related mechanisms of catalytic antagonistic genes in different advanced oxidation processes (AOPs) systems. We also summarize the removal mechanism of ARGs and how to reduce the spread of ARGs in the environment through combining a variety of characterization methods. Importantly, the potential of various catalysts for removing ARGs in practical applications has also been recognized, providing a promising approach for the deep purification of wastewater treatment plants.

摘要

作为一种新型且持久的环境污染物,抗生素耐药细菌(ARB)和抗生素耐药基因(ARGs)已在不同的水生环境中频繁检出,对公众健康和生态系统构成潜在风险,引发了一个不容忽视的生物安全问题。因此,为了控制环境中抗生素耐药性的传播,高级氧化技术(如类芬顿、光催化、电催化)已成为灭活和消除 ARB 和 ARGs 的有效手段。然而,在高级氧化技术过程中,研究和调控分子水平上的催化活性位点,并研究催化剂与 ARGs 之间的吸附和表面氧化反应,可以深入探究 ARGs 去除的机制。本综述系统地揭示了不同高级氧化工艺(AOPs)系统中催化拮抗基因的催化活性位点和相关机制。我们还总结了 ARGs 的去除机制,以及如何通过结合多种表征方法来减少 ARGs 在环境中的传播。重要的是,还认识到了各种催化剂在实际应用中去除 ARGs 的潜力,为深度净化污水处理厂提供了一种有前景的方法。

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Molecular level removal of antibiotic resistant bacteria and genes: A review of interfacial chemical in advanced oxidation processes.分子水平去除抗生素耐药菌和基因:界面化学在高级氧化过程中的作用综述。
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The role of TiO and gCN bimetallic catalysts in boosting antibiotic resistance gene removal through photocatalyst assisted peroxone process.TiO和gCN双金属催化剂在光催化剂辅助过氧酮过程中增强抗生素抗性基因去除方面的作用。
Sci Rep. 2024 Oct 2;14(1):22897. doi: 10.1038/s41598-024-74147-4.