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使用微米级入射束的无参考X射线荧光分析。

Reference-free x-ray fluorescence analysis with a micrometer-sized incident beam.

作者信息

Hönicke Philipp, Wählisch André, Unterumsberger Rainer, Beckhoff Burkhard, Bogdanowicz Janusz, Charley Anne-Laure, Mertens Hans, Rochat Névine, Hartmann Jean-Michel, Giambacorti Narciso

机构信息

Physikalisch-Technische Bundesanstalt (PTB) Abbestr. 2-12 D-10587 Berlin, Germany.

Imec Kapeldreef 75 B-3001 Leuven, Belgium.

出版信息

Nanotechnology. 2024 Apr 24;35(28). doi: 10.1088/1361-6528/ad3aff.

Abstract

Spatially resolved x-ray fluorescence (XRF) based analysis employing incident beam sizes in the low micrometer range (XRF) is widely used to study lateral composition changes of various types of microstructured samples. However, up to now the quantitative analysis of such experimental datasets could only be realized employing adequate calibration or reference specimen. In this work, we extent the applicability of the so-called reference-free XRF approach to enable reference-freeXRF analysis. Here, no calibration specimen are needed in order to derive a quantitative and position sensitive composition of the sample of interest. The necessary instrumental steps to realize reference-freeXRF are explained and a validation of ref.-freeXRF against ref.-free standard XRF is performed employing laterally homogeneous samples. Finally, an application example from semiconductor research is shown, where the lateral sample features require the usage of ref.-freeXRF for quantitative analysis.

摘要

基于空间分辨X射线荧光(XRF)的分析采用低微米级的入射光束尺寸(XRF),被广泛用于研究各种类型微结构样品的横向成分变化。然而,到目前为止,此类实验数据集的定量分析只能通过使用适当的校准或参考样品来实现。在这项工作中,我们扩展了所谓的无参考XRF方法的适用性,以实现无参考XRF分析。在此,为了获得感兴趣样品的定量和位置敏感成分,无需校准样品。解释了实现无参考XRF所需的仪器步骤,并使用横向均匀的样品对无参考XRF与无参考标准XRF进行了验证。最后,展示了一个半导体研究中的应用实例,其中样品的横向特征需要使用无参考XRF进行定量分析。

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