Zhao Jianguo, Yin Rui, Xu Ru, Zhang Hui, Chen Kai, Xu Shenyu, Tao Tao, Zhuang Zhe, Liu Bin, Xiong Yuwei, Chang Jianhua
School of Electronics and Information Engineering, Nanjing University of Information Science and Technology, Nanjing, Jiangsu 210044, People's Republic of China.
School of Electronic Science and Engineering, Nanjing University, Nanjing, Jiangsu 210023, People's Republic of China.
ACS Appl Mater Interfaces. 2024 Apr 11. doi: 10.1021/acsami.4c01806.
A high-performance planar structure metal-semiconductor-metal-type solar-blind photodetector (SBPD) was fabricated on the basis of (010)-plane β-GaO thermally oxidized from nonpolar (110)-plane GaN. A full width at half maximum of 0.486° was achieved for the X-ray rocking curve associated with (020)-plane β-GaO, which is better than most reported results for the heteroepitaxially grown (-201)-plane β-GaO. As a result of the relatively high crystalline quality, a dark current as low as 6.30 × 10 A was achieved at 5 V, while the photocurrent reached 1.86 × 10 A under 254 nm illumination at 600 μW/cm. As a result, the photo-to-dark current ratio, specific detectivity, responsivity, and external quantum efficiency were calculated to be 2.95 × 10, 2.39 × 10 Jones, 3.72 A/W, and 1815%, respectively. Moreover, the SBPD showed excellent repeatability and stability in the time-dependent photoresponse characteristics with fast relaxation time constants for the rise and decay processes of only 0.238 and 0.062 s, respectively. This study provides a promising approach to fabricate the device-level (010)-plane β-GaO film and a new way for the epitaxial growth of (010)-plane β-GaO and (110)-plane GaN as mutual substrates.
基于从非极性(110)面GaN热氧化得到的(010)面β-GaO制备了一种高性能平面结构金属-半导体-金属型日盲光电探测器(SBPD)。与(020)面β-GaO相关的X射线摇摆曲线的半高宽达到0.486°,这优于大多数报道的异质外延生长的(-201)面β-GaO的结果。由于具有相对较高的晶体质量,在5V时实现了低至6.30×10A的暗电流,而在600μW/cm的254nm光照下光电流达到1.86×10A。结果,计算得到的光暗电流比、比探测率、响应度和外量子效率分别为2.95×10、2.39×10琼斯、3.72A/W和1815%。此外,SBPD在随时间变化的光响应特性方面表现出优异的重复性和稳定性,上升和衰减过程的快速弛豫时间常数分别仅为0.238和0.062s。本研究为制备器件级(010)面β-GaO薄膜提供了一种有前景的方法,并为(010)面β-GaO和(110)面GaN作为相互衬底的外延生长提供了一种新途径。