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脑内植入电极相关的结构、功能和遗传改变。

Structural, Functional, and Genetic Changes Surrounding Electrodes Implanted in the Brain.

机构信息

Neuroscience Program, Michigan State University, 775 Woodlot Dr., East Lansing, Michigan 48824, United States.

Institute for Quantitative Health Science and Engineering, Michigan State University, 775 Woodlot Dr., East Lansing, Michigan 48824, United States.

出版信息

Acc Chem Res. 2024 May 7;57(9):1346-1359. doi: 10.1021/acs.accounts.4c00057. Epub 2024 Apr 17.

Abstract

Implantable neurotechnology enables monitoring and stimulating of the brain signals responsible for performing cognitive, motor, and sensory tasks. Electrode arrays implanted in the brain are increasingly used in the clinic to treat a variety of sources of neurological diseases and injuries. However, the implantation of a foreign body typically initiates a tissue response characterized by physical disruption of vasculature and the neuropil as well as the initiation of inflammation and the induction of reactive glial states. Likewise, electrical stimulation can induce damage to the surrounding tissue depending on the intensity and waveform parameters of the applied stimulus. These phenomena, in turn, are likely influenced by the surface chemistry and characteristics of the materials employed, but further information is needed to effectively link the biological responses observed to specific aspects of device design. In order to inform improved design of implantable neurotechnology, we are investigating the basic science principles governing device-tissue integration. We are employing multiple techniques to characterize the structural, functional, and genetic changes that occur in the cells surrounding implanted electrodes. First, we have developed a new "device-in-slice" technique to capture chronically implanted electrodes within thick slices of live rat brain tissue for interrogation with single-cell electrophysiology and two-photon imaging techniques. Our data revealed several new observations of tissue remodeling surrounding devices: (a) there was significant disruption of dendritic arbors in neurons near implants, where losses were driven asymmetrically on the implant-facing side. (b) There was a significant loss of dendritic spine densities in neurons near implants, with a shift toward more immature (nonfunctional) morphologies. (c) There was a reduction in excitatory neurotransmission surrounding implants, as evidenced by a reduction in the frequency of excitatory postsynaptic currents (EPSCs). Lastly, (d) there were changes in the electrophysiological underpinnings of neuronal spiking regularity. In parallel, we initiated new studies to explore changes in gene expression surrounding devices through spatial transcriptomics, which we applied to both recording and stimulating arrays. We found that (a) device implantation is associated with the induction of hundreds of genes associated with neuroinflammation, glial reactivity, oligodendrocyte function, and cellular metabolism and (b) electrical stimulation induces gene expression associated with damage or plasticity in a manner dependent upon the intensity of the applied stimulus. We are currently developing computational analysis tools to distill biomarkers of device-tissue interactions from large transcriptomics data sets. These results improve the current understanding of the biological response to electrodes implanted in the brain while producing new biomarkers for benchmarking the effects of novel electrode designs on responses. As the next generation of neurotechnology is developed, it will be increasingly important to understand the influence of novel materials, surface chemistries, and implant architectures on device performance as well as the relationship with the induction of specific cellular signaling pathways.

摘要

可植入神经技术能够监测和刺激负责执行认知、运动和感官任务的大脑信号。电极阵列被越来越多地植入大脑中,用于治疗各种来源的神经疾病和损伤。然而,异物的植入通常会引发组织反应,表现为血管和神经原的物理破坏,以及炎症的启动和反应性神经胶质状态的诱导。同样,电刺激也会根据施加刺激的强度和波形参数引起周围组织的损伤。这些现象反过来又可能受到所使用材料的表面化学性质和特性的影响,但需要进一步的信息来将观察到的生物反应与设备设计的具体方面有效联系起来。为了为可植入神经技术的改进设计提供信息,我们正在研究控制设备-组织整合的基础科学原理。我们正在使用多种技术来描述植入电极周围细胞发生的结构、功能和遗传变化。首先,我们开发了一种新的“片内设备”技术,用于捕获活大鼠脑组织厚切片中慢性植入的电极,以便用单细胞电生理学和双光子成像技术进行检测。我们的数据揭示了围绕设备的组织重塑的一些新观察结果:(a) 植入部位附近神经元的树突分支有明显的破坏,损失是在植入部位的一侧不对称地驱动的。(b) 植入部位附近神经元的树突棘密度显著降低,向更不成熟(无功能)的形态转变。(c) 植入部位周围兴奋性神经递质传递减少,表现为兴奋性突触后电流(EPSC)频率降低。最后,(d) 神经元放电节律的电生理基础发生变化。同时,我们通过空间转录组学开始了新的研究,以探索设备周围基因表达的变化,我们将其应用于记录和刺激阵列。我们发现,(a) 设备植入与数百种与神经炎症、神经胶质反应、少突胶质细胞功能和细胞代谢相关的基因的诱导有关,(b) 电刺激以依赖于施加刺激强度的方式诱导与损伤或可塑性相关的基因表达。我们目前正在开发计算分析工具,从大型转录组学数据集中提取设备-组织相互作用的生物标志物。这些结果提高了我们对大脑中植入电极后生物反应的理解,同时产生了新的生物标志物,用于基准测试新型电极设计对反应的影响。随着下一代神经技术的发展,了解新型材料、表面化学性质和植入结构对设备性能的影响以及与特定细胞信号通路诱导的关系将变得越来越重要。

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