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Development of a 50 kV hydrogen-helium mixed ion beam implanter.

作者信息

Huang W, Cai S X, Wang L, Su Y K, Zhu K

机构信息

Institute of Guangdong Laser Plasma Advanced Technology, Guangzhou, Guangdong 510540, China.

State Key Laboratory of Nuclear Physics and Technology, Peking University, Beijing 100871, China.

出版信息

Rev Sci Instrum. 2024 Apr 1;95(4). doi: 10.1063/5.0200849.

DOI:10.1063/5.0200849
PMID:38634720
Abstract

Ion implanters have extensively been employed to simulate the irradiation effects of neutrons on relevant nuclear materials. In this study, a 50 kV hydrogen-helium mixed ion beam implanter was developed to generate H2+ and He+ ion beams, with a beam current of 20 µA, while keeping the impurity ion content below 2%. The ions are generated by an antenna-type 2.45 GHz electron cyclotron resonance ion source, and the hydrogen-to-helium ion beam ratio was controlled using two gas mass flow controllers to ensure long time stability of the beam current. As a result, the H2+/He+ ratio, beam size, and homogeneity of the beam spot can be maintained at a stable level. The beam line consisted of four Wien filters, a movable dual-slit plate, and an accelerator tube. The experimental results demonstrated successful transport of more than 20 µA of H2+ and He+ ion beams onto the target, with a beam axis deviation of less than 0.5 mm.

摘要

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