Department of Mechanical Engineering, University of California at Berkeley, Berkeley, CA 94720, USA; Western Digital Corporation, Recording Sub System Staging and Research, San Jose, CA 95135, USA.
Western Digital Corporation, Recording Sub System Staging and Research, San Jose, CA 95135, USA.
STAR Protoc. 2024 Jun 21;5(2):103039. doi: 10.1016/j.xpro.2024.103039. Epub 2024 Apr 25.
In this protocol, we present a facile nanoscale thermal mapping technique for electronic devices by use of atomic force microscopy and a phase change material GeSbTe. We describe steps for GeSbTe thin film coating, GeSbTe temperature calibration, thermal mapping by varying heater power, and thermal mapping by varying heating time. The protocol can be applied for resolving surface temperatures of various operational microelectronic devices with a nanoscale precision. For complete details on the use and execution of this protocol, please refer to Cheng et al..
在本方案中,我们展示了一种通过原子力显微镜和相变材料 GeSbTe 对电子设备进行纳米级热映射的简便技术。我们描述了 GeSbTe 薄膜涂层、GeSbTe 温度校准、通过改变加热器功率进行热映射以及通过改变加热时间进行热映射的步骤。该方案可应用于以纳米级精度解析各种工作微电子设备的表面温度。如需了解本方案使用和执行的完整详细信息,请参考 Cheng 等人的研究。