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用于半导体工业应用的基于深紫外发光二极管的臭氧传感器的设计与性能评估

Design and Performance Evaluation of a Deep Ultraviolet LED-Based Ozone Sensor for Semiconductor Industry Applications.

作者信息

Xu Maosen, Tian Xin, Lin Yuzhe, Xu Yan, Tao Jifang

机构信息

College of Electrical Engineering and Automation, Shandong University of Science and Technology, Qingdao 266590, China.

College of Electronic and Information Engineering, Shandong University of Science and Technology, Qingdao 266590, China.

出版信息

Micromachines (Basel). 2024 Mar 30;15(4):476. doi: 10.3390/mi15040476.

DOI:10.3390/mi15040476
PMID:38675285
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC11052474/
Abstract

Ozone (O) is a critical gas in various industrial applications, particularly in semiconductor manufacturing, where it is used for wafer cleaning and oxidation processes. Accurate and reliable detection of ozone concentration is essential for process control, ensuring product quality, and safeguarding workplace safety. By studying the UV absorption characteristics of O and combining the specific operational needs of semiconductor process gas analysis, a pressure-insensitive ozone gas sensor has been developed. In its optical structure, a straight-through design without corners was adopted, achieving a coupling efficiency of 52% in the gas chamber. This device can operate reliably in a temperature range from 0 °C to 50 °C, with only ±0.3% full-scale error across the entire temperature range. The sensor consists of a deep ultraviolet light-emitting diode in a narrow spectrum centered at 254 nm, a photodetector, and a gas chamber, with dimensions of 85 mm × 25 mm × 35 mm. The performance of the sensor has been meticulously evaluated through simulation and experimental analysis. The sensor's gas detection accuracy is 750 ppb, with a rapid response time () of 7 s, and a limit of detection of 2.26 ppm. It has the potential to be applied in various fields for ozone monitoring, including the semiconductor industry, water treatment facilities, and environmental research.

摘要

臭氧(O₃)是各种工业应用中的关键气体,尤其是在半导体制造中,用于晶圆清洗和氧化工艺。准确可靠地检测臭氧浓度对于过程控制、确保产品质量和保障工作场所安全至关重要。通过研究臭氧的紫外线吸收特性,并结合半导体工艺气体分析的特定操作需求,开发了一种对压力不敏感的臭氧气体传感器。在其光学结构中,采用了无拐角的直通式设计,在气室中实现了52%的耦合效率。该装置可在0°C至50°C的温度范围内可靠运行,在整个温度范围内满量程误差仅为±0.3%。该传感器由一个中心波长为254nm的窄谱深紫外发光二极管、一个光电探测器和气室组成,尺寸为85mm×25mm×35mm。通过模拟和实验分析对传感器的性能进行了精心评估。该传感器的气体检测精度为750ppb,快速响应时间为7s,检测限为2.26ppm。它有潜力应用于包括半导体行业、水处理设施和环境研究在内的各种臭氧监测领域。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/d044/11052474/976da3df38cb/micromachines-15-00476-g008.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/d044/11052474/dfa38aabfb32/micromachines-15-00476-g001.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/d044/11052474/05107cb9adff/micromachines-15-00476-g002.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/d044/11052474/09c68e9d697c/micromachines-15-00476-g003.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/d044/11052474/3af65453d3e6/micromachines-15-00476-g004.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/d044/11052474/11090f7e8e41/micromachines-15-00476-g005.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/d044/11052474/fd38f503e85b/micromachines-15-00476-g006.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/d044/11052474/139ac0782fc0/micromachines-15-00476-g007.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/d044/11052474/976da3df38cb/micromachines-15-00476-g008.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/d044/11052474/dfa38aabfb32/micromachines-15-00476-g001.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/d044/11052474/05107cb9adff/micromachines-15-00476-g002.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/d044/11052474/09c68e9d697c/micromachines-15-00476-g003.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/d044/11052474/3af65453d3e6/micromachines-15-00476-g004.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/d044/11052474/11090f7e8e41/micromachines-15-00476-g005.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/d044/11052474/fd38f503e85b/micromachines-15-00476-g006.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/d044/11052474/139ac0782fc0/micromachines-15-00476-g007.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/d044/11052474/976da3df38cb/micromachines-15-00476-g008.jpg

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