Xu Shijie, Dai Bingqian, Jiang Yuhao, Xiong Danrong, Cheng Houyi, Tai Lixuan, Tang Meng, Sun Yadong, He Yu, Yang Baolin, Peng Yong, Wang Kang L, Zhao Weisheng
National Key Laboratory of Spintronics, Hangzhou International Innovation Institute, Beihang University, 311115, Hangzhou, China.
Department of Electrical and Computer Engineering, University of California, Los Angeles, CA, 90095, USA.
Nat Commun. 2024 May 2;15(1):3717. doi: 10.1038/s41467-024-46325-5.
The chiral antiferromagnetic (AFM) materials, which have been widely investigated due to their rich physics, such as non-zero Berry phase and topology, provide a platform for the development of antiferromagnetic spintronics. Here, we find two distinctive anomalous Hall effect (AHE) contributions in the chiral AFM MnPt, originating from a time-reversal symmetry breaking induced intrinsic mechanism and a skew scattering induced topological AHE due to an out-of-plane spin canting with respect to the Kagome plane. We propose a universal AHE scaling law to explain the AHE resistivity ( ) in this chiral magnet, with both a scalar spin chirality (SSC)-induced skew scattering topological AHE term, and non-collinear spin-texture induced intrinsic anomalous Hall term, . We found that and can be effectively modulated by the interfacial electron scattering, exhibiting a linear relation with the inverse film thickness. Moreover, the scaling law can explain the anomalous Hall effect in various chiral magnets and has far-reaching implications for chiral-based spintronics devices.
手性反铁磁(AFM)材料因其丰富的物理性质,如非零贝里相位和拓扑结构,而受到广泛研究,为反铁磁自旋电子学的发展提供了一个平台。在此,我们在手性AFM材料MnPt中发现了两种独特的反常霍尔效应(AHE)贡献,一种源于时间反演对称性破缺诱导的本征机制,另一种是由于相对于 Kagome 平面的面外自旋倾斜导致的斜散射诱导的拓扑 AHE。我们提出了一个通用的AHE标度律来解释这种手性磁体中的AHE电阻率( ),其中包括标量自旋手性(SSC)诱导的斜散射拓扑AHE项 ,以及非共线自旋纹理诱导的本征反常霍尔项 。我们发现 和 可以通过界面电子散射有效地调制,与薄膜厚度的倒数呈线性关系。此外,该标度律可以解释各种手性磁体中的反常霍尔效应,对手性自旋电子学器件具有深远的意义。