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外尔半金属MnGe中的强反常霍尔效应和温度驱动的里夫希茨转变

Robust anomalous Hall effect and temperature-driven Lifshitz transition in Weyl semimetal MnGe.

作者信息

Wang Xiaolei, Pan Dong, Zeng Qingqi, Chen Xue, Wang Hailong, Zhao Duo, Xu Zhiyang, Yang Qianqian, Deng Jinxiang, Zhai Tianrui, Wu Guangheng, Liu Enke, Zhao Jianhua

机构信息

State Key Laboratory of Superlattices and Microstructures, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China.

State Key Laboratory of Magnetism, Institute of Physics, Chinese Academy of Sciences, Beijing 100190, China.

出版信息

Nanoscale. 2021 Feb 4;13(4):2601-2608. doi: 10.1039/d0nr07946d.

Abstract

Topological Weyl semimetals have attracted considerable interest because they manifest underlying physics and device potential in spintronics. Large anomalous Hall effect (AHE) in non-collinear antiferromagnets (AFMs) represents a striking Weyl phase, which is associated with Bloch-band topological features. In this work, we report robust AHE and Lifshitz transition in high-quality Weyl semimetal Mn3Ge thin film, comprising stacked Kagome lattice and chiral antiferromagnetism. We successfully achieved giant AHE in our Mn3Ge film, with a strong Berry curvature enhanced by the Weyl phase. The enormous coercive field HC in our AHE curve at 5 K reached an unprecedented 5.3 T among hexagonal Mn3X systems. Our results provide direct experimental evidence of an electronic topological transition in the chiral AFMs. The temperature was demonstrated to play an efficient role in tuning the carrier concentration, which could be quantitatively determined by the two-band model. The electronic band structure crosses the Fermi energy level and leads to the reversal of carrier type around 50 K. The results not only offer new functionality for effectively modulating the Fermi level location in topological Weyl semimetals but also present a promising route of manipulating the carrier concentration in antiferromagnetic spintronic devices.

摘要

拓扑外尔半金属因其在自旋电子学中展现出潜在的物理特性和器件应用潜力而备受关注。非共线反铁磁体(AFM)中的大反常霍尔效应(AHE)代表了一种显著的外尔相,它与布洛赫能带拓扑特征相关。在这项工作中,我们报道了高质量外尔半金属Mn3Ge薄膜中的稳健反常霍尔效应和里夫希茨转变,该薄膜由堆叠的 Kagome 晶格和手性反铁磁性组成。我们在Mn3Ge薄膜中成功实现了巨大的反常霍尔效应,其具有由外尔相增强的强贝里曲率。在5K时,我们的反常霍尔效应曲线中的巨大矫顽场HC在六角形Mn3X系统中达到了前所未有的5.3T。我们的结果为手性反铁磁体中的电子拓扑转变提供了直接的实验证据。结果表明温度在调节载流子浓度方面发挥了有效作用,这可以通过双带模型进行定量确定。电子能带结构在50K左右穿过费米能级并导致载流子类型反转。这些结果不仅为有效调制拓扑外尔半金属中的费米能级位置提供了新功能,而且还为在反铁磁自旋电子器件中操纵载流子浓度提供了一条有前景的途径。

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