Mao Zijie, Wu Yicai, Xu Xindi, Chao Yang, Zhang Xia-Guang, Wang Chong, Cai Wen-Bin
Shanghai Key Laboratory of Molecular Catalysis and Innovative Materials, Collaborative Innovation Center of Chemistry for Energy Materials, Department of Chemistry, Fudan University, Shanghai 200438, China.
Key Laboratory of Green Chemical Media and Reactions, Ministry of Education, Collaborative Innovation Center of Henan Province for Green Manufacturing of Fine Chemicals, College of Chemistry and Chemical Engineering, Henan Normal University, Xinxiang 453007, China.
J Phys Chem Lett. 2024 Jun 27;15(25):6668-6675. doi: 10.1021/acs.jpclett.4c00888. Epub 2024 Jun 20.
The interfacial adsorption structure of an organic leveler decides its functionality in Cu interconnect electroplating and is yet far from clear. In this work, attenuated total reflection surface-enhanced infrared absorption spectroscopy (ATR-SEIRAS) and electrochemical quartz crystal microbalance (EQCM) in conjunction with density functional theory (DFT) calculations are applied to unravel the interfacial adsorption of the classic dye leveler Janus Green B (JGB) at a Cu electrode and understand its polarization property against Cu electrodeposition from an adsorption structure perspective. ATR-SEIRAS measurements and DFT calculations reveal that the N=N bond of the JGB molecule splits via reductive hydrogenation, forming two fragments of contrasting adsorption configurations. JGB exhibits the strongest inhibition effect on Cu deposition among all the tested additives including individual and mixed fragments, due to the highest coverage of organic adsorbates from JGB dissociation, as measured by EQCM. This work highlights the advantage of surface sensitive analytical tools in understanding the structure-performance of levelers.
有机整平剂的界面吸附结构决定了其在铜互连电镀中的功能,但其仍远未明确。在本工作中,采用衰减全反射表面增强红外吸收光谱(ATR-SEIRAS)和电化学石英晶体微天平(EQCM)并结合密度泛函理论(DFT)计算,以揭示经典染料整平剂Janus Green B(JGB)在铜电极上的界面吸附情况,并从吸附结构角度理解其对铜电沉积的极化特性。ATR-SEIRAS测量和DFT计算表明,JGB分子的N=N键通过还原氢化断裂,形成两种吸附构型相反的片段。通过EQCM测量发现,在所有测试的添加剂(包括单个片段和混合片段)中,JGB对铜沉积的抑制作用最强,这是由于JGB解离产生的有机吸附质覆盖率最高。这项工作突出了表面敏感分析工具在理解整平剂结构-性能方面的优势。