Guo Siming, Zhu Wei, Han Guangyu, Zhang Qingqing, Zhou Jie, Guo Zhanpeng, Bao Shucheng, Liu Yutong, Zhao Shijie, Wang Boyi, Deng Yuan
School of Materials Science and Engineering, Beihang University, Beijing, 100191, China.
Key Laboratory of Intelligent Sensing Materials and Chip Integration Technology of Zhejiang Province, Hangzhou Innovation Institute of Beihang University, Hangzhou, 310051, China.
Small Methods. 2024 Dec;8(12):e2400589. doi: 10.1002/smtd.202400589. Epub 2024 Jun 27.
The evolutions of chip thermal management and micro energy harvesting put forward urgent need for micro thermoelectric devices. Nevertheless, low-performance thermoelectric thick films as well as the complicated precision cutting process for hundred-micron thermoelectric legs still remain the bottleneck hindering the advancement of micro thermoelectric devices. In this work, an innovative direct melt-calendaring manufacturing technology is first proposed with specially designed and assembled equipment, that enables direct, rapid, and cost-effective continuous manufacturing of BiTe-based films with thickness of hundred microns. Based on the strain engineering with external glass coating confinement and controlled calendaring deformation degree, enhanced thermoelectric performance has been achieved for (Bi,Sb)Te thick films with highly textured nanocrystals, which can promote carrier mobility over 182.6 cm V s and bring out a record-high zT value of 0.96 and 1.16 for n-type and p-type (Bi,Sb)Te thick films, respectively. The nanoscale interfaces also further improve the mechanical strength with excellent elastic modules (over 42.0 GPa) and hardness (over 1.7 GPa), even superior to the commercial zone-melting ingots and comparable to the hot-extrusion (Bi,Sb)Te alloys. This new fabrication strategy is versatile to a wide range of inorganic thermoelectric thick films, which lays a solid foundation for the development of micro thermoelectric devices.
芯片热管理和微能量收集的发展对微热电装置提出了迫切需求。然而,低性能的热电厚膜以及用于制造数百微米热电腿的复杂精密切割工艺仍然是阻碍微热电装置发展的瓶颈。在这项工作中,首次提出了一种创新的直接熔体压延制造技术,该技术采用了专门设计和组装的设备,能够直接、快速且经济高效地连续制造厚度为数百微米的铋碲基薄膜。基于外部玻璃涂层约束的应变工程和可控的压延变形程度,具有高度织构化纳米晶体的(铋,锑)碲厚膜实现了增强的热电性能,其可使载流子迁移率超过182.6 cm V s,并且n型和p型(铋,锑)碲厚膜分别达到创纪录的高zT值0.96和1.16。纳米级界面还进一步提高了机械强度,具有出色的弹性模量(超过42.0 GPa)和硬度(超过1.7 GPa),甚至优于商业区域熔炼锭,与热挤压(铋,锑)碲合金相当。这种新的制造策略适用于广泛的无机热电厚膜,为微热电装置的发展奠定了坚实的基础。